ALIGNMENT DEVICE FOR EXPOSURE APPARATUS

WIPO Patent Application WO/2012/160928

A1

In the present invention, a sensor of a camera is used to detect alignment marks on a substrate and alignment marks on a mask, through a filter having a transmission region for long-wavelength light and a transmission region for short-wavelength light. The long-wavelength light has a long focal length and the short-wavelength light has a short focal length, and thus the long-wavelength light within reflected light from the substrate alignment marks and short-wavelength light within reflected light from the mask alignment marks can be simultaneously imaged by the sensor of the camera and can be simultaneously observed. The substrate and mask are aligned such that a midpoint for the substrate alignment marks and a midpoint for the mask alignment marks are matched. This makes it possible to achieve high-precision alignment of the substrate and mask even when the gap between the substrate or mask and the camera sensor fluctuates or when the optical axis of the optical path deviates.

HASHIMOTO KAZUSHIGE (JP)
ARAI TOSHINARI (JP)
HATANAKA MAKOTO (JP)

PCT/JP2012/060942

November 29, 2012

April 24, 2012

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V TECHNOLOGY CO LTD (JP)
HASHIMOTO KAZUSHIGE (JP)
ARAI TOSHINARI (JP)
HATANAKA MAKOTO (JP)

G03F9/00; H01L21/027

JPS6441805A	1989-02-14
JPS6222432A	1987-01-30
JPS6381817A	1988-04-12
JPH1131644A	1999-02-02
JPH02105406A	1990-04-18
JPH04255210A	1992-09-10

FUJIMAKI MASANORI (JP)
Masanori Fujimaki (JP)

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