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Title:
ALIGNMENT MARK, SUBSTRATE AND FABRICATION METHOD THEREFOR, AND EXPOSURE ALIGNMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2019/105098
Kind Code:
A1
Abstract:
An alignment mark, substrate and fabrication method therefor, and exposure alignment method. The alignment mark comprises an alignment area (1), a peripheral area (2) and a shielding area (3). The alignment area (1) is provided with an outer contour (1001); the peripheral area (2) is arranged at least around part of the outer contour (1001) of the alignment area (1); the shielding area (3) is arranged around the outer contour (1001) of the alignment area (1) and does not overlap with the peripheral area (2); and the alignment area (1) and shielding area (3) are not transparent, and the peripheral area (2) is at least partially transparent.

Inventors:
MA QINGLIN (CN)
ZHAO BAOJIE (CN)
ZHOU CONGHUI (CN)
WANG LI (CN)
LI JIAN (CN)
ZHAO YAN (CN)
HUI XIANG (CN)
WANG XIONGWEI (CN)
MA CHUNHONG (CN)
Application Number:
PCT/CN2018/104655
Publication Date:
June 06, 2019
Filing Date:
September 07, 2018
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
G03F9/00; G03F1/42
Foreign References:
CN101271281A2008-09-24
CN105182697A2015-12-23
CN106054543A2016-10-26
CN101286010A2008-10-15
CN104503203A2015-04-08
US20070146587A12007-06-28
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
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