Title:
ALIGNMENT MARK, SUBSTRATE AND FABRICATION METHOD THEREFOR, AND EXPOSURE ALIGNMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2019/105098
Kind Code:
A1
Abstract:
An alignment mark, substrate and fabrication method therefor, and exposure alignment method. The alignment mark comprises an alignment area (1), a peripheral area (2) and a shielding area (3). The alignment area (1) is provided with an outer contour (1001); the peripheral area (2) is arranged at least around part of the outer contour (1001) of the alignment area (1); the shielding area (3) is arranged around the outer contour (1001) of the alignment area (1) and does not overlap with the peripheral area (2); and the alignment area (1) and shielding area (3) are not transparent, and the peripheral area (2) is at least partially transparent.
Inventors:
MA QINGLIN (CN)
ZHAO BAOJIE (CN)
ZHOU CONGHUI (CN)
WANG LI (CN)
LI JIAN (CN)
ZHAO YAN (CN)
HUI XIANG (CN)
WANG XIONGWEI (CN)
MA CHUNHONG (CN)
ZHAO BAOJIE (CN)
ZHOU CONGHUI (CN)
WANG LI (CN)
LI JIAN (CN)
ZHAO YAN (CN)
HUI XIANG (CN)
WANG XIONGWEI (CN)
MA CHUNHONG (CN)
Application Number:
PCT/CN2018/104655
Publication Date:
June 06, 2019
Filing Date:
September 07, 2018
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
G03F9/00; G03F1/42
Foreign References:
CN101271281A | 2008-09-24 | |||
CN105182697A | 2015-12-23 | |||
CN106054543A | 2016-10-26 | |||
CN101286010A | 2008-10-15 | |||
CN104503203A | 2015-04-08 | |||
US20070146587A1 | 2007-06-28 |
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
Download PDF: