PRIORITY CLAIM AND CROSS-REFERENCE

[0001] This application claims the benefit of U.S. Provisional Application No.

63/010,251, filed April 15, 2020 and U.S. Provisional Application No. 62/856,170, filed June 3, 2019 and U.S. Provisional Application No. 62/886,687, filed August 14, 2019, which applications are expressly incorporated by reference herein in their entirety.

FIELD

[0002] The disclosure relates to glass composition generally. More particularly, the disclosed subject matter relates to glass compositions comprising alkali metal and suitable for use in display applications.

BACKGROUND

[0003] Flat or curved substrates made of an optically transparent material such as glass are used for flat panel display, photovoltaic devices, and other suitable applications. In addition to the requirement for optical clarity, glass compositions need to meet different challenges depending on fabrication process and the applications.

[0004] For example, the production of liquid crystal displays such as active matrix liquid crystal display devices (AMLCDs) is complex, and the properties of the substrate glass are important. The glass substrates used in the production of AMLCD devices need to have their physical dimensions tightly controlled. The downdraw sheet drawing processes and, in particular, the fusion process, are capable of producing glass sheets that can be used as substrates without requiring costly post-forming finishing operations such as lapping and polishing.

However, the fusion process places rather severe restrictions on the glass properties, which require relatively high liquidus viscosities.

[0005] In the liquid crystal display field, thin film transistors (TFTs) may be based on poly-crystalline silicon (p-Si) or amorphous silicon (a-Si). Amorphous silicon offers advantages such as lower processing temperature. Sometimes poly-crystalline silicon is preferably used because of their ability to transport electrons more effectively. Poly-crystalline based silicon transistors are characterized as having a higher mobility than those based on amorphous-silicon based transistors. This allows the manufacture of smaller and faster transistors, which ultimately produces brighter and faster displays. One problem with p-Si based transistors is that their manufacture requires higher process temperatures than those employed in the manufacture of a- Si transistors. These temperatures range from 450°C to 600°C compared to the 350°C peak temperatures employed in the manufacture of a-Si transistors.

[0006] The glass compositions used for display applications need to have good thermal and mechanical properties, and dimensional stability satisfying the processing and performance requirements. In addition, diffusion of metal ions into the thin film transistors may cause damages to the transistors. Such diffusion needs to be minimized or eliminated.

SUMMARY

[0007] The present disclosure provides a glass composition, a method of making the same and a method of using the same. The present disclosure also provides a glass substrate comprising such a glass composition, and a display device comprising such a glass composition or a glass substrate having such a glass composition.

[0008] In accordance with some embodiments, a glass composition comprises:

about 50 mol. % to about 75 mol. % SiC ,

11.1 mol. % to about 25 mol. % AI2O3,

about 1.5 mol. % to about 10 mol. % B2O3,

about 0.5 mol. % to about 20 mol. % of R2O, which is an alkali metal oxide selected from the group consisting of K2O, Rb ₂ 0, CS2O, and a combination thereof,

0 mol. % to about 12 mol. % MgO,

0 mol. % to about 10 mol. % CaO,

0 mol. % to about 1.5 mol. % SrO, and

0 mol. % to about 5 mol. % BaO.

[0009] The glass composition comprises about 1 mol. % to about 20 mol. % R’O in total, and R’O comprises MgO, CaO, SrO, BaO, optionally ZnO, and any combination thereof. [0010] In the glass composition, S1O2 is present in any suitable range. Examples of a suitable range include, but are not limited to, about 50 mol.% to about 60 mol.%, about 54 mol.% to about 68 mol.%, about 60 mol.% to 75 about mol.%, or about 60 mol.% to about 70 mol.%. In some embodiments, the content of S1O2 is equal to or less than 60 mol.%, for example, in a range of about 50 mol.% to about 60 mol.%.

[0011] In some embodiments, AI2O3 has a content above 11 mol.%. Examples of a suitable range of AI2O3 include, but are not limited to, about 11.5 mol.% to about 25 mol.%, about 12 mol.% to about 25 mol.%, about 13 mol.% to about 25 mol.%, about 14 mol.% to about 25 mol.%, about 15 mol.% to about 25 mol.%, about 11.5 mol.% to about 25 mol.%, about 11.5 mol.% to about 18 mol.%, about 12 mol.% to about 20 mol.%, or about 12 mol.% to about 18 mol.%.

[0012] In some embodiments, the alkali metal oxide (R2O) is K2O. The alkali metal oxide (R2O) has a content in any suitable range. Examples of a suitable range of R2O include, but are not limited to, about 0.5 mol.% to about 10 mol.%, about 1 mol.% to about 10 mol.%, about 0.9 mol.% to about 7.1 mol.%, about 0.5 mol.% to about 8 mol.%, about 2 mol.% to about 8 mol.%, or about 3 mol.% to about 8 mol.%.

[0013] The glass composition may further comprise 0 mol. % to about 2 mol.% of additional alkali metal oxide selected from the group consisting of LEO, Na ₂ 0, and a

combination thereof. LEO or Na ₂ 0 is optional. The content of LEO and Na ₂ 0 is 0 mol. % to about 1 mol.%, or 0.1 mol. % to about 2 mol.% in the glass composition in some embodiments. When LEO or Na20 is present, the total content of alkali metal oxide K2O, Rb20, CS2O and LEO or Na ₂ 0 is about 0.5 mol. % to about 22 mol. %. In some embodiments, the glass composition is substantially free of LEO, Na ₂ 0 and any other ingredients containing Li and Na.

[0014] R’O may comprise alkaline earth metal oxides such as MgO, CaO, SrO and BaO, and optionally comprises ZnO, in any suitable ranges.

[0015] Examples of a suitable range of MgO include, but are not limited to, about 0 mol.% to about 12 mol.%, about 1 mol.% to about 12 mol.%, about 2 mol.% to about 12 mol.%, about 1 mol.% to about 10 mol.%, or about 2 mol.% to about 10 mol.%. In some embodiments, MgO has a content equal to or higher than 7 mol.%, for example, in a range of about 7 mol.% to about 12 mol.%, or about 7 mol.% to about 10 mol.%. [0016] In some embodiments, SrO may has a content of equal to or less than 1.5 mo. % or 1 mol.%, for example, in a range of about 0.1 mol.% to about 1 mol.%, or about 0.1 mol.% to about 1.5 mol.%.

[0017] Examples of a suitable range of CaO include, but are not limited to, about 0 mol.% to about 10 mol.%, about 1 mol.% to about 10 mol.%, about 2 mol.% to about 10 mol.%, about 3 mol.% to about 8 mol.%, about 5 mol.% to about 8 mol.%, or about 6 mol.% to about 8 mol.%.

[0018] In some embodiments, a molar ratio of RO/AI2O3 is in a range of from about 0.8 to about 1.5, for example, from about 0.8 to about 1.0, from about 0.9 to about 1.1, or from about 1 to about 1.25. In some embodiments, the ratio of RO/AI2O3 is equal to or less than 1.

[0019] The composition may comprise any other suitable ingredients such as SnCh. The present disclosure provides any suitable composition with different combinations of the ingredients and content ranges as described herein.

[0020] In some embodiments, an exemplary glass composition comprises:

about 54 mol. % to about 68 mol. % S1O2;

11.1 mol. % to about 18 mol. % AI2O3;

about 2 mol. % to about 9 mol. % B2O3;

about 8 mol. % to about 16 mol. % of R2O, wherein R2O is an alkali metal oxide selected from the group consisting of K2O, Rb20, CS2O, and a combination thereof;

0 mol. % to about 12 mol. % MgO;

0 mol. % to about 10 mol. % CaO;

0 mol. % to about 1.5 mol. % SrO;

0 mol. % to about 5 mol. % BaO,

wherein the glass composition comprises about 1 mol. % to about 15 mol. % R’O in total, and R’O comprises MgO, CaO, SrO, BaO, and any combination thereof.

[0021] In some embodiments, the alkali metal oxide (R2O) is K2O. Such a composition may comprise Rb ₂ 0 or CS2O. The composition may optionally comprise L12O or Na ₂ 0 or be substantially free of L12O or Na20.

[0022] In some embodiments, MgO may be in a range of about 7 mol.% to about 12 mol.%, and SrO is in a range of about 0.1 mol.% to about 1 mol.%. The molar ratio of

RO/AI2O3 may be in a range of about 0.8 to about 1. [0023] The glass composition provides both processing and performance advantages.

For example, the glass composition has a low liquidus temperature and high liquidus viscosity. The liquidus temperature is equal to or less than 1 ,200 °C, for example, in a range of about 900 °C to 1,200 °C, or about 1,000 °C to 1,200 °C, about 900 °C to 1,185 °C, or about 1,000 °C to 1,185 °C, about 900 °C to 1,150 °C, or about 1,000 °C to 1,150 °C. The glass composition has a liquidus viscosity equal to or higher than 100 kPoise, for example, in a range of from about 200 kPoise to about 400 kPoise, from about 200 kPoise to about 600 kPoise, or from about 200 kPoise to about 800 kPoise. In some embodiments, the liquidus viscosity may be in the range of from 100 kPoise to 800 kPoise, for example, from about 100 kPoise to about 550 kPoise, or from about 200 kPoise to about 450 kPoise.

[0024] The glass composition has a low coefficient of thermal expansion, for example, in a range of from about 10x l0 ^_7 /°C to about 62xlO ^_7 /°C at a temperature from 20 °C to 300 °C.

In some embodiments, the CTE is in a range of from about 20x l0 ^_7 /°C. to about 55xl0 ^_7 /°C, from about 30xl0 ^_7 /°C. to about 55xl0 ^_7 /°C, from about 30xl0 ^_7 /°C. to about 40x l0 ^_7 /°C, or from about 30xl0 ^_7 /°C. to about 50xl0 ^_7 /°C.

[0025] In another aspect, the present disclosure also provides a method of making and a method of using the glass composition described herein, a glass article (or component) comprising such a glass composition, and a display device comprising the glass composition or a glass article having the glass composition.

[0026] Examples of a glass article include, but are not limited to a panel, a substrate, a cover, a backplane, and any other components used in an electronic device for display applications. For example, in some embodiments, the glass composition or the glass substrate is a cover or backplane in an electronic device. In some embodiments, thin film resistors are built on or in contact with the glass composition. Examples of the electronic devices include, but are not limited to, liquid crystal display (LCD), light emitting diode (LED) display, computer monitors, automated teller machines (ATMs), touch screen, and photovoltaic devices. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The present disclosure is best understood from the following detailed description when read in conjunction with the accompanying drawings. It is emphasized that, according to common practice, these drawings are for illustrations of some embodiments only.

[0028] FIG. 1 graphically depicts the relationship between the content of alkali oxide

(e.g., K2O) and the liquidus temperature of comparative and inventive glass compositions in accordance with some embodiments.

[0029] FIG. 2 graphically depicts the relationship between the content of alkali oxide

(e.g., K2O) and the liquidus viscosity of comparative and inventive glass compositions in accordance with some embodiments.

[0030] FIGS. 3A-3B show average mol% K within A) a SiO film and B) a SiN film deposited on an exemplary glass substrate containing 5 mol% K2O after different heat treatments.

DETAILED DESCRIPTION

[0031] This description of the exemplary embodiments is intended to be read in connection with the accompanying drawings, which are to be considered part of the entire written description. In the description, relative terms such as“lower,”“upper,”“horizontal,” “vertical,”,“above,”“below,”“up,”“down,” “top” and“bottom” as well as derivative thereof (e.g.,“horizontally,”“downwardly,”“upwardly,” etc.) should be construed to refer to the orientation as then described or as shown in the drawing under discussion. These relative terms are for convenience of description and do not require that the apparatus be constructed or operated in a particular orientation. Terms concerning attachments, coupling and the like, such as“connected” and“interconnected,” refer to a relationship wherein structures are secured or attached to one another either directly or indirectly through intervening structures, as well as both movable or rigid attachments or relationships, unless expressly described otherwise.

[0032] For purposes of the description hereinafter, it is to be understood that the embodiments described below may assume alternative variations and embodiments. It is also to be understood that the specific articles, compositions, and/or processes described herein are exemplary and should not be considered as limiting. [0033] In the present disclosure the singular forms“a,”“an,” and“the” include the plural reference, and reference to a particular numerical value includes at least that particular value, unless the context clearly indicates otherwise. When values are expressed as approximations, by use of the antecedent“about,” it will be understood that the particular value forms another embodiment. As used herein,“about X” (where X is a numerical value) preferably refers to ±10% of the recited value, inclusive. For example, the phrase“about 8” preferably refers to a value of 7.2 to 8.8, inclusive. Where present, all ranges are inclusive and combinable. For example, when a range of“1 to 5” is recited, the recited range should be construed as including ranges“1 to 4”,“1 to 3”,“1-2”,“1-2 & 4-5”,“1-3 & 5”,“2-5”, and the like. In addition, when a list of alternatives is positively provided, such listing can be interpreted to mean that any of the alternatives may be excluded, e.g., by a negative limitation in the claims. For example, when a range of“1 to 5” is recited, the recited range may be construed as including situations whereby any of 1, 2, 3, 4, or 5 are negatively excluded; thus, a recitation of“1 to 5” may be construed as “1 and 3-5, but not 2”, or simply“wherein 2 is not included.” It is intended that any component, element, attribute, or step that is positively recited herein may be explicitly excluded in the claims, whether such components, elements, attributes, or steps are listed as alternatives or whether they are recited in isolation.

[0034] The terms“substantial,”“substantially,” and variations thereof as used herein are intended to note that a described feature is equal or approximately equal to a value or description. Moreover,“substantially similar” is intended to denote that two values are equal or approximately equal. In some embodiments,“substantially similar” may denote values within about 10% of each other, such as within about 5% of each other, or within about 2% of each other.

[0035] The present disclosure provides a glass composition, a method of making the same and a method of using the same. The present disclosure also provides a glass substrate or article comprising such a glass composition, and a display device comprising such a glass composition or a glass substrate having such a glass composition. Such a glass composition comprises the ingredients as described herein, including a high content of AI2O3, and an alkali metal oxide such as K2O, Rb ₂ 0, CS2O, or a combination thereof. As described herein, the inventors have surprisingly found that such a glass composition comprising alkali metal oxide and a high content of AI2O3 provides low liquidus temperature, high liquidus viscosity, a low coefficient of thermal expansion, and good mechanical properties. The inventors have also surprisingly found that no diffusion of metal ions such as alkali metal ions from the glass composition exists when the composition is used in electronic devices. Any possible

contamination caused by diffusion of alkali metals can be minimized or eliminated.

[0036] Unless expressly indicated otherwise, the term“glass article” or“glass” used herein is understood to encompass any object made wholly or partly of glass. Glass articles include monolithic substrates, or laminates of glass and glass, glass and non-glass materials, glass and crystalline materials, and glass and glass-ceramics (which include an amorphous phase and a crystalline phase).

[0037] The glass article such as a glass panel may be flat or curved and is transparent or substantially transparent. As used herein, the term“transparent” is intended to denote that the article, at a thickness of approximately 1 mm, has a transmission of greater than about 85% in the visible region of the spectrum (400-700 nm). For instance, an exemplary transparent glass panel may have greater than about 85% transmittance in the visible light range, such as greater than about 90%, greater than about 95%, or greater than about 99% transmittance, including all ranges and subranges therebetween. According to various embodiments, the glass article may have a transmittance of less than about 50% in the visible region, such as less than about 45%, less than about 40%, less than about 35%, less than about 30%, less than about 25%, or less than about 20%, including all ranges and subranges therebetween. In certain embodiments, an exemplary glass panel may have a transmittance of greater than about 50% in the ultraviolet (UV) region (100-400 nm), such as greater than about 55%, greater than about 60%, greater than about 65%, greater than about 70%, greater than about 75%, greater than about 80%, greater than about 85%, greater than about 90%, greater than about 95%, or greater than about 99% transmittance, including all ranges and subranges therebetween.

[0038] Exemplary glasses can include, but are not limited to, aluminosilicate, alkali- aluminosilicate, borosilicate, alkali-borosilicate, aluminoborosilicate, alkali- aluminoborosilicate, and other suitable glasses. In some embodiments, the glass article may be strengthened mechanically by utilizing a mismatch of the coefficient of thermal expansion between portions of the article to create a compressive stress region and a central region exhibiting a tensile stress. In some embodiments, the glass article may be strengthened thermally by heating the glass to a temperature above the glass transition point and then rapidly quenching. In some other embodiments, the glass article may be chemically strengthening by ion exchange.

[0039] In some embodiments, the glass compositions described herein are alkaline earth alumino-silicate glass compositions, which generally include a combination of SiC , AI2O3, at least one alkaline earth oxide, and alkali metal oxide including at least one of K2O, Rb ₂ 0, and CS2O. The glass compositions described herein have an amorphous structure. Crystalline or polycrystalline structures may be also made using the compositions.

[0040] The term“softening point,” as used herein, refers to the temperature at which the viscosity of the glass composition is 1 xl0 ^{7 6} poise. The softening point is measured using the method of parallel plate viscosity (PPV).

[0041] The term“annealing point,” as used herein, refers to the temperature at which the viscosity of the glass composition is 1 xlO ^{13 18} poise.

[0042] The terms“strain point” and“T _s train” as used herein, refers to the temperature at which the viscosity of the glass composition is 10 ^{14 68} poise.

[0043] The liquidus temperature of a glass (¾) is the temperature (°C) above which no crystalline phases can coexist in equilibrium with the glass. The liquidus viscosity is the viscosity of a glass at the liquidus temperature.

[0044] The term“CTE,” as used herein, refers to the coefficient of thermal expansion of the glass composition over a temperature range from about room temperature (RT) to about 300° C.

[0045] In the embodiments of the glass compositions described herein, the concentrations of constituent components (e.g., S1O2, AI2O3, and the like) are specified in mole percent (mol. %) on an oxide basis, unless otherwise specified.

[0046] The terms“free” and“substantially free,” when used to describe the concentration and/or absence of a particular constituent component in a glass composition, means that the constituent component is not intentionally added to the glass composition. However, the glass composition may contain traces of the constituent component as a contaminant or tramp in amounts of less than 0.01 mol. %.

[0047] In accordance with some embodiments, a glass composition comprises:

about 50 mol. % to about 75 mol. % S1O2,

11.1 mol. % to about 25 mol. % AI2O3, about 1.5 mol. % to about 10 mol. % B2O3,

about 0.5 mol. % to about 20 mol. % of R2O, which is an alkali metal oxide selected from the group consisting of K2O, Rb ₂ 0, CS2O, and a combination thereof,

0 mol. % to about 12 mol. % MgO,

0 mol. % to about 10 mol. % CaO,

0 mol. % to about 1.5 mol. % SrO, and

0 mol. % to about 5 mol. % BaO.

[0048] The glass composition comprises about 1 mol. % to about 20 mol. % R’O in total, and R’O comprises MgO, CaO, SrO, BaO, optionally ZnO, and any combination thereof.

[0049] In the embodiments of the glass compositions described herein, S1O2 is the largest constituent of the composition and, as such, is the primary constituent of the glass network. In some embodiments, S1O2 may be used to obtain the desired liquidus viscosity while, at the same time, offsetting the amount of AI2O3 added to the composition.

[0050] In the glass composition, S1O2 is present in any suitable range. Examples of a suitable range include, but are not limited to, about 50 mol.% to about 60 mol.%, about 54 mol.% to about 68 mol.%, about 60 mol.% to 75 about mol.%, or about 60 mol.% to about 70 mol.%. In some embodiments, the content of S1O2 is equal to or less than 60 mol.%, for example, in a range of about 50 mol.% to about 60 mol.%.

[0051] The glass compositions described herein further include AI2O3, at a relatively high content. In some embodiments, AI2O3 has a content above 11 mol.%. Examples of a suitable range of AI2O3 include, but are not limited to, about 11.5 mol.% to about 25 mol.%, about 12 mol.% to about 25 mol.%, about 13 mol.% to about 25 mol.%, about 14 mol.% to about 25 mol.%, about 15 mol.% to about 25 mol.%, about 11.5 mol.% to about 25 mol.%, about 11.5 mol.% to about 18 mol.%, about 12 mol.% to about 20 mol.%, or about 12 mol.% to about 18 mol.%.

[0052] The glass compositions in the embodiments described herein also include alkali oxides. Preferably, the glass compositions described herein include at least one of K2O, Rb ₂ 0, CS2O, or a combination thereof. In some embodiments, the alkali metal oxide (R2O) is K2O.

The alkali metal oxide (R2O) has a content in any suitable range. Examples of a suitable range of R2O include, but are not limited to, about 0.5 mol.% to about 10 mol.%, about 1 mol.% to about 10 mol.%, about 0.9 mol.% to about 7.1 mol.%, about 0.5 mol.% to about 8 mol.%, about 2 mol.% to about 8 mol.%, or about 3 mol.% to about 8 mol.%.

[0053] AI2O3, when present, may act in a manner similar to S1O2 and may increase the viscosity of the glass composition when in a tetrahedral coordination in a glass melt formed from the glass composition. However, as described in U.S. Patent No. 10, 112, 865, it was thought that the presence of AI2O3 in the glass compositions would increases the mobility of alkali constituents in the glass components, and the amount of AI2O3 in the glass compositions needs to be carefully considered.

[0054] The inventors of the present disclosure have surprisingly found that a high content of AI2O3, in conjunction with alkali oxides present in the glass compositions, reduces the propensity of alkali constituents from diffusion or leaching out of the glass, or maintain the alkali constituents in the composition under processing conditions on which thin film transistors are formed in or on a substrate comprising the glass composition.

[0055] In addition, as described in U.S. Patent No. 10, 112, 865, it was also thought the addition of alkali oxides such as K2O to the glass compositions would increase the average coefficient of thermal expansion of the resultant glass. However, the inventors of the present disclosure have surprisingly found that the glass composition having alkali oxides in

combination with a high content of AI2O3 has a relatively low thermal expansion. Meanwhile, such a combination also decreases the liquidus temperature of the glass composition and increases the liquidus viscosity of the glass composition. The combination of a decreased liquidus temperature and an increased liquidus viscosity improve the processability of the glass compositions.

[0056] The glass composition may further comprise 0 mol. % to about 2 mol.% of additional alkali metal oxide selected from the group consisting of L12O, Na ₂ 0, and a

combination thereof. L12O or Na ₂ 0 is optional. The content of L12O and Na ₂ 0 is 0 mol. % to about 1 mol.%, or 0.1 mol. % to about 2 mol.% in the glass composition in some embodiments. When L12O or Na ₂ 0 is present, the total content of alkaline metal oxide K2O, Rb ₂ 0, CS2O and L12O or Na ₂ 0 is about 0.5 mol. % to about 22 mol. %. In some embodiments, the glass composition is substantially free of L12O, Na ₂ 0 and any other ingredients containing Li and Na.

[0057] K2O, Rb ₂ 0, CS2O or a combination thereof is used as the primary alkali oxide constituent as the relatively large ionic radius of K Rb or Cs, compared to Na or Li, decreases the diffusivity of the alkali metal in the glass. Low diffusivity is very important when the glass composition is used to form backplanes for displays because the diffusion of alkali metal from the glass to thin film transistors deposited on the glass damages the transistors.

[0058] The glass compositions in the embodiments described herein further comprise

B2O3. Like S1O2 and AI2O3, B2O3 contributes to the formation of the glass network.

Conventionally, B2O3 may be added to a glass composition to decrease the viscosity of the glass composition. In some embodiments, the glass composition comprising B2O3 also has a high or desirable liquidus viscosity. In the embodiments described herein, B2O3 is generally present in the glass compositions in an amount from about 1.5 mol.% to about 10 mol. %, for example, from about 2 mol.% to about 9 mol. %, or from about 1.6 mol.% to about 9.1 mol. %.

[0059] R’O may comprise alkaline earth metal oxides such as MgO, CaO, SrO and BaO, and optionally comprises ZnO, in any suitable ranges.

[0060] In addition to the glass formers (S1O2, AI2O3, and B2O3), the glasses described herein may also include alkaline earth oxides. In some embodiments, at least one, two or three alkaline earth oxides are part of the glass composition, e.g., MgO, CaO, and BaO, and, optionally, SrO. The alkaline earth oxides provide the glass with various properties important to melting, fining, forming, and ultimate use. Accordingly, to improve glass performance in these regards, in one embodiment, the ratio of (Mg0+Ca0+Sr0+Ba0)/Al ₂ 0 ₃ ratio is equal to or less than about 1.5 or about 1. In some embodiments, the ratio (Mg0+Ca0+Sr0+Ba0)/Al203 is less than 1, for example, in a range of from 0.8 to 1. In some embodiments, the ratio of

(MgO+CaO+SrO+BaOyALCb ratio is around 1, for example, in a range of from 0.9 to 1.1.

[0061] A small amount of MgO may be optionally added to the glass composition in some embodiments. Examples of a suitable range of MgO include, but are not limited to, about 0 mol.% to about 12 mol.%, about 1 mol.% to about 12 mol.%, about 2 mol.% to about 12 mol.%, about 1 mol.% to about 10 mol.%, and about 2 mol.% to about 10 mol.%. In some

embodiments, MgO has a content equal to or higher than 7 mol.%, for example, in a range of about 7 mol.% to about 12 mol.%, or about 7 mol.% to about 10 mol.%.

[0062] In some embodiments, SrO may has a content of equal to or less than 1.5 mo. % or 1 mol.%, for example, in a range of about 0.1 mol.% to about 1 mol.%, or about 0.1 mol.% to about 1.5 mol.%. [0063] Examples of a suitable range of CaO include, but are not limited to, about 0 mol.% to about 10 mol.%, about 1 mol.% to about 10 mol.%, about 2 mol.% to about 10 mol.%, about 3 mol.% to about 8 mol.%, about 5 mol.% to about 8 mol.%, or about 6 mol.% to about 8 mol.%.

[0064] In some embodiments, a molar ratio of RO/AI2O3 is in a range of from about 0.8 to about 1.5, for example, from about 0.8 to about 1.0, from about 0.9 to about 1.1, or from about 1 to about 1.25. In some embodiments, the ratio of RO/AI2O3 is equal to or less than 1.

[0065] The composition may comprise any other suitable ingredients such as SnCh.

SnCh may be in a suitable range, for example, from 0 mol. % to about 1 mol.%. In some embodiments, SnCE is present in an amount of from 0.01 mol.% to 0.5 mol.%, for example, from 0.05 mol.% to 0.15 mol.%.

[0066] The present disclosure provides any suitable composition with different combinations of the ingredients and content ranges as described herein.

[0067] In some embodiments, an exemplary glass composition comprises:

about 54 mol. % to about 68 mol. % S1O2;

11.1 mol. % to about 18 mol. % AI2O3;

about 2 mol. % to about 9 mol. % B2O3;

about 8 mol. % to about 16 mol. % of R2O, wherein R2O is an alkali metal oxide selected from the group consisting of K2O, Rb ₂ 0, CS2O, and a combination thereof;

0 mol. % to about 12 mol. % MgO;

0 mol. % to about 10 mol. % CaO;

0 mol. % to about 1.5 mol. % SrO;

0 mol. % to about 5 mol. % BaO,

wherein the glass composition comprises about 1 mol. % to about 15 mol. % R’O in total, and R’O comprises MgO, CaO, SrO, BaO, and any combination thereof.

[0068] In some embodiments, the alkali metal oxide (R2O) is K2O. Such a composition may comprise Rb ₂ 0 or CS2O, or any combination of K2O, Rb ₂ 0 and CS2O. The composition may optionally comprise L12O or Na ₂ 0. More preferably, the composition is substantially free of L12O or Na20 or both. [0069] In some embodiments, MgO may be in a range of about 7 mol.% to about 12 mol.%, and SrO is in a range of about 0.1 mol.% to about 1 mol.%. The molar ratio of

RO/AI2O3 may be in a range of from about 0.8 to about 1.

[0070] The glass composition provides both processing and performance advantages.

For example, the glass composition has a low liquidus temperature (Tuq) and high liquidus viscosity. The liquidus temperature may be equal to or less than 1,200 °C, for example, in a range of about 900 °C to 1,200 °C, or about 1,000 °C to 1,200 °C, about 900 °C to 1,185 °C, or about 1,000 °C to 1,185 °C, about 900 °C to 1,150 °C, or about 1,000 °C to 1,150 °C.

[0071] The glass composition has a liquidus viscosity equal to or higher than 100 kPoise, for example, in a range of from about 200 kPoise to about 400 kPoise, from about 200 kPoise to about 600 kPoise, or from about 200 kPoise to about 800 kPoise. In some embodiments, the liquidus viscosity may be in the range of from 100 kPoise to 800 kPoise, for example, from about 100 kPoise to about 550 kPoise, or from about 200 kPoise to about 450 kPoise.

[0072] The glass composition has low coefficient of thermal expansion, for example, in a range of from about 10xl0 ^_7 /°C. to about 62x lO ^_7 /°C. at a temperature from 20 °C to 300 °C. In some embodiments, the CTE is in a range of from about 20x l0 ^_7 /°C. to about 55x l0 ^_7 /°C, from about 30xl0 ^_7 /°C. to about 55xl0 ^_7 /°C, from about 30xl0 ^_7 /°C. to about 40x l0 ^_7 /°C, or from about 30xl0 ^_7 /°C. to about 50xl0 ^_7 /°C.

[0073] In another aspect, the present disclosure also provides a method of making and a method of using the glass composition described herein, a glass article (or component) comprising such a glass composition, and a display device comprising the glass composition or a glass article having the glass composition.

[0074] Examples of a glass article include, but are not limited to a panel, a substrate, a cover, a backplane, or any other components used in an electronic device for display

applications. In some embodiments, the glass article such as a substrate or a panel is optically transparent. Examples of the glass article include, but are not limited to, a flat or curved glass panel.

[0075] For example, in some embodiments, the glass composition or the glass substrate is a cover or backplane in an electronic device. In some embodiments, thin film resistors are built on or in contact with the glass composition. The thin film resistors may be amorphous silicon based or poly-crystalline silicon based. In some embodiments, the glass composition provided in the present disclosure is used as a substrate or a layer, in or on which amorphous silicon based transistors are disposed. Examples of the electronic devices include, but are not limited to, liquid crystal display (LCD), light emitting diode (LED) display, computer monitors, automated teller machines (ATMs), touch screen, and photovoltaic devices.

[0076] EXAMPLES

[0077] The following examples are set forth below to illustrate the methods and results according to the disclosed subject matter. These examples are not intended to be inclusive of all embodiments of the subject matter disclosed herein, but rather to illustrate representative methods and results. These examples are not intended to exclude equivalents and variations of the present disclosure which are apparent to one skilled in the art.

[0078] Efforts have been made to ensure accuracy with respect to numbers (e.g., amounts, temperature, etc.) but some errors and deviations should be accounted for. Unless indicated otherwise, temperature is in °C or is at ambient temperature, and pressure is at or near atmospheric. The compositions themselves are given in mole percent on an oxide basis and have been normalized to 100%. There are numerous variations and combinations of reaction conditions, e.g., component concentrations, temperatures, pressures and other reaction ranges and conditions that can be used to optimize the product purity and yield obtained from the described process. Only reasonable and routine experimentation will be required to optimize such process conditions.

[0079] The glass properties set forth in the tables were determined in accordance with techniques conventional in the glass art. Thus, the linear coefficient of thermal expansion (CTE) over the temperature range 25-300°C is expressed in terms of x 10 ⁷ /°C, and the annealing point is expressed in terms of °C. The CTE was determined following ASTM standard E228. The annealing point was determined from beam bending viscosity (BBV) measurement technique following ASTM standard C598, unless expressly indicated otherwise. The density in terms of grams/cm ³ was measured via the Archimedes method (ASTM C693). The melting temperature in terms of °C (defined as the temperature at which the glass melt demonstrates a viscosity of 200 poises) was calculated employing a Fulcher equation fit to high temperature viscosity data measured via rotating cylinders viscometry (ASTM C965-81). [0080] The liquidus temperature of the glass in terms of °C was measured using the standard gradient boat liquidus method of ASTM C829-81. This involves placing crushed glass particles in a platinum boat, placing the boat in a furnace having a region of gradient temperatures, heating the boat in an appropriate temperature region for 24 hours, and determining by means of microscopic examination the highest temperature at which crystals appear in the interior of the glass. More particularly, the glass sample is removed from the Pt boat in one piece and examined using polarized light microscopy to identify the location and nature of crystals which have formed against the Pt and air interfaces and in the interior of the sample. Because the gradient of the furnace is very well known, temperature vs. location can be well estimated, within 5-10°C. The temperature at which crystals are observed in the internal portion of the sample is taken to represent the liquidus of the glass (for the corresponding test period). Testing is sometimes carried out at longer times (e.g. 72 hours) to observe slower growing phases. The liquidus viscosity in poises was determined from the liquidus temperature and the coefficients of the Fulcher equation.

[0081] Young's modulus and shear modulus in terms of GPa, and Poisson’s ratio were determined using a resonant ultrasonic spectroscopy (RUS) technique of the general type set forth in ASTM E1875-00el.

[0082] Stress optical coefficient (SOC) values can be measured as set forth in Procedure

C (Glass Disc Method) of ASTM standard C770-16, entitled“Standard Test Method for Measurement of Glass Stress-Optical Coefficient.”

[0083] The exemplary glasses of Table 1 were prepared using a commercial sand as a silica source, milled such that 90% by weight passed through a standard U.S. 100 mesh sieve. Alumina was the alumina source, periclase was the source for MgO, limestone the source for CaO, strontium carbonate, strontium nitrate or a mix thereof was the source for SrO, barium carbonate was the source for BaO, and tin (IV) oxide was the source for SnC . The raw materials were thoroughly mixed, and double melted in crucibles. The raw materials can be also mixed and then loaded into a platinum vessel suspended in a furnace heated by silicon carbide glowbars, melted and stirred for several hours at temperatures between 1,600 and 1,650 °C, and delivered through an orifice at the base of the platinum vessel. The mixing and double melting procedures ensured homogeneity. The resulting patties of glass were annealed at or near the annealing point, and then subjected to various experimental methods to determine physical, viscous and liquidus attributes.

[0084] These methods are not unique, and the glass compositions can be prepared using standard methods well-known to those skilled in the art. Such methods include a continuous melting process, such as would be performed in a continuous melting process, wherein the melter used in the continuous melting process is heated by gas, by electric power, or combinations thereof.

[0085] Raw materials appropriate for producing exemplary glasses include commercially available sands as sources for S1O2; alumina, aluminum hydroxide, hydrated forms of alumina, and various aluminosilicates, nitrates and halides as sources for AI2O3; boric acid, anhydrous boric acid and boric oxide as sources for B2O3; periclase, dolomite (also a source of CaO), magnesia, magnesium carbonate, magnesium hydroxide, and various forms of magnesium silicates, aluminosilicates, nitrates and halides as sources for MgO; limestone, aragonite, dolomite (also a source of MgO), wollastonite, and various forms of calcium silicates, aluminosilicates, nitrates and halides as sources for CaO; and oxides, carbonates, nitrates and halides of strontium and barium. If a chemical fining agent is desired, tin can be added as Sn02, as a mixed oxide with another major glass component (e.g., CaSnOs), or in oxidizing conditions as SnO, tin oxalate, tin halide, or other compounds of tin known to those skilled in the art.

[0086] The exemplary glass compositions contain SnC as a fining agent, but other chemical fining agents could also be employed to obtain glass of sufficient quality for TFT substrate applications. For example, exemplary glasses could employ any one or combinations of AS2O3, Sb ₂ 0 ₃ , CeC , Fe ₂ C> ₃ , and halides as deliberate additions to facilitate fining, and any of these could be used in conjunction with the SnC chemical fining agent shown in the examples. Of these, AS2O3 and SI52O3 are generally recognized as hazardous materials, subject to control in waste streams such as might be generated in the course of glass manufacture or in the processing of TFT panels. It is therefore desirable to limit the concentration of AS2O3 and SI52O3 individually or in combination to no more than 0.005 mol%.

[0087] In addition to the elements deliberately incorporated into exemplary glasses, nearly all stable elements in the periodic table are present in glasses at some level, either through low levels of contamination in the raw materials, through high-temperature erosion of refractories and precious metals in the manufacturing process, or through deliberate introduction at low levels to fine tune the attributes of the final glass. For example, zirconium may be introduced as a contaminant via interaction with zirconium-rich refractories. As a further example, platinum and rhodium may be introduced via interactions with precious metals. As a further example, iron may be introduced as a tramp in raw materials, or deliberately added to enhance control of gaseous inclusions. As a further example, manganese may be introduced to control color or to enhance control of gaseous inclusions.

[0088] Hydrogen is inevitably present in the form of the hydroxyl anion, OH , and its presence can be ascertained via standard infrared spectroscopy techniques. Dissolved hydroxyl ions significantly and nonlinearly impact the annealing point of exemplary glasses, and thus to obtain the desired annealing point it may be necessary to adjust the concentrations of major oxide components so as to compensate. Hydroxyl ion concentration can be controlled to some extent through choice of raw materials or choice of melting system. For example, boric acid is a major source of hydroxyls, and replacing boric acid with boric oxide can be a useful means to control hydroxyl concentration in the final glass. The same reasoning applies to other potential raw materials comprising hydroxyl ions, hydrates, or compounds comprising physisorbed or chemisorbed water molecules. If burners are used in the melting process, then hydroxyl ions can also be introduced through the combustion products from combustion of natural gas and related hydrocarbons, and thus it may be desirable to shift the energy used in melting from burners to electrodes to compensate. Alternatively, one might instead employ an iterative process of adjusting major oxide components so as to compensate for the deleterious impact of dissolved hydroxyl ions.

[0089] Sulfur is often present in natural gas, and likewise is a tramp component in many carbonate, nitrate, halide, and oxide raw materials. In the form of SO2, sulfur can be a troublesome source of gaseous inclusions. The tendency to form SC -rich defects can be managed to a significant degree by controlling sulfur levels in the raw materials, and by incorporating low levels of comparatively reduced multivalent cations into the glass matrix. While not wishing to be bound by theory, it appears that SC -rich gaseous inclusions arise primarily through reduction of sulfate (SO-f ) dissolved in the glass.

[0090] The elevated barium concentrations of exemplary glasses appear to increase sulfur retention in the glass in early stages of melting, but as noted above, barium is required to obtain low liquidus temperature, and hence high liquidus viscosity. Deliberately controlling sulfur SP19-200 levels in raw materials to a low level is a useful means of reducing dissolved sulfur (presumably as sulfate) in the glass. In particular, sulfur is preferably less than 200 ppm by weight in the batch materials, and more preferably less than 100 ppm by weight in the batch materials.

[0091] Reduced multivalents can also be used to control the tendency of exemplary glasses to form SO2 blisters. While not wishing to be bound to theory, these elements behave as potential electron donors that suppress the electromotive force for sulfate reduction. Sulfate reduction can be written in terms of a half reaction such as

where e denotes an electron. The“equilibrium constant” for the half reaction is

Ke _q = [S0 ₂ ] [0 ₂ ] [e ] ² /[S0 ₄ ⁼ ]

where the brackets denote chemical activities. Ideally one would like to force the reaction so as to create sulfate from SO2, O2 and 2e . Adding nitrates, peroxides, or other oxygen-rich raw materials may help, but also may work against sulfate reduction in the early stages of melting, which may counteract the benefits of adding them in the first place. SO2 has very low solubility in most glasses, and so is impractical to add to the glass melting process. Electrons may be “added” through reduced multivalents. For example, an appropriate electron-donating half reaction for ferrous iron (Fe ²⁺ ) is expressed as

[0092] This“activity” of electrons can force the sulfate reduction reaction to the left, stabilizing SO-T in the glass. Suitable reduced multivalents include, but are not limited to, Fe ²⁺ , Mn ²⁺ , Sn ²⁺ , Sb ³⁺ , As ³⁺ , V ³⁺ , Ti ³⁺ , and others familiar to those skilled in the art. In each case, it may be important to minimize the concentrations of such components so as to avoid deleterious impact on color of the glass, or in the case of As and Sb, to avoid adding such components at a high enough level so as to complication of waste management in an end-user’s process.

[0093] In addition to the major oxides components of exemplary glasses, and the minor or tramp constituents noted above, halides may be present at various levels, either as

contaminants introduced through the choice of raw materials, or as deliberate components used to eliminate gaseous inclusions in the glass. As a fining agent, halides may be incorporated at a level of about 0.4 mol% or less, though it is generally desirable to use lower amounts if possible to avoid corrosion of off-gas handling equipment. In some embodiments, the concentrations of individual halide elements are below about 200 ppm by weight for each individual halide, or below about 800 ppm by weight for the sum of all halide elements.

[0094] In addition to these major oxide components, minor and tramp components, multivalents and halide fining agents, it may be useful to incorporate low concentrations of other colorless oxide components to achieve desired physical, optical or viscoelastic properties. Such oxides include, but are not limited to, TiCh, ZrCh, HfCh, NboOj, TaoOj, M0O3, WO3, ZnO,

ImC , Ga2C>3, B12O3, GeCh, PbO, SeCE, TeCE, Y2O3, I.&2O , Gd2CE, and others known to those skilled in the art. Through an iterative process of adjusting the relative proportions of the major oxide components of exemplary glasses, such colorless oxides can be added to a level of up to about 2 mol.%, for example, less than 0.5 mo.% without unacceptable impact to annealing point or liquidus viscosity.

[0095] Table 1 shows the compositions of Experimental Examples 1-6 (“Ex. 1-6”).

Table 2 shows the compositions of Experimental Examples 7-12 (“Ex. 7-12”). Table 3 shows the compositions of Experimental Examples 13-18 (“Ex. 13-18”). Table 4 shows the

compositions of Experimental Examples 19-24 (“Ex. 19-24”). Examples 1-24 are also labelled in an order of from“A” to“X.” The property data of Examples 1-24 including softening point, annealing point, Young’s modulus, shear modulus, Poisson’s ratio, and hardness are also listed in Tables 1-4. Table 5 shows liquidus temperature and liquidus viscosity of Examples 1-6. Table 5 shows liquidus temperature and liquidus viscosity of Examples 13-18. In the tables, standard deviation is abbreviated as“st. dev.,” and the coefficient of variation is abbreviated as“COV,” or “covar.”

[0096] Table 1.

SP19-200

[0097] Table 2

[0098] Table 3

[0099] Table 4

[00100] Table 5 SP19-200

[00101] Table 6

[00102] FIG. 1 illustrates the relationship between the content of K2O and the liquidus temperature of Examples 1-3 (“A-C”). FIG. 2 illustrates the relationship between the content of K2O and the liquidus viscosity of Examples 1-3 (“A-C”). In FIGS. 1-2, Examples 1-3 are compared to a comparative product, which is commercially available from Corning Inc. under tradename EAGLE XG (“EXG”) and contains no K2O. The product EXG has a liquidus temperature of 1140 °C and a liquidus viscosity of 228,527 poise. As shown in Tables 5-6 and FIGS. 1-2, the glass composition provided in the present disclosure has a lower liquidus temperature and higher liquidus viscosity. The liquidus temperature is equal to or less than 1,200 °C. For example, the liquidus temperature can be adjusted to be in a range of about 900 °C to 1,185 °C, or about 1,000 °C to 1,185 °C, 900 °C to 1,150 °C, or about 1,000 °C to 1,150 °C.

[00103] The glass composition has a liquidus viscosity equal to or higher than 100 kPoise. For example, the liquidus viscosity can be adjusted to be in a range of about 200 kPoise to about 400 kPoise, about 200 kPoise to about 600 kPoise, about 100 kPoise to about 550 kPoise, or about 200 kPoise to about 450 kPoise, or about 200 kPoise to about 800 kPoise. Such an increase in liquidus viscosity and such a decrease in liquidus temperature provide significant processing advantages and decrease manufacturing cost.

[00104] Referring to Table 1, the glass composition has low coefficient of thermal expansion (CTE). For example, Examples 1-6 have CTE in a range of from about 30x l0 ^_7 /°C. to about 62X10 ^_7 /°C, mostly in a range of from about 30xl0 ^_7 /°C. to about 55xl0 ^_7 /°C at a temperature from 20 °C to 300 °C.

[00105] As can be seen in Tables 1-4, the exemplary glasses have good properties such as annealing point and Young’s modulus values that make the glasses suitable for display applications, such as AMLCD substrate applications, and more particularly for low-temperature polysilicon and oxide thin film transistor applications. The glasses have durabilities in acid and base media that are similar to those obtained from commercial AMLCD substrates, and thus are appropriate for AMLCD applications. The exemplary glasses can be formed using downdraw techniques, and in particular are compatible with the fusion process.

[00106] Further, despite a significant level of alkali metal oxide used, no metal ions such as alkali metal ions are leached or diffused out from the glass compositions when the compositions are used in electronic devices.

[00107] FIGS. 3A-3B show average mol.% K within A) a SiO film and B) a SiN film deposited on an exemplary glass substrate containing about 5 mol.% K2O after different heat treatments. The exemplary glass substrate includes 60.7 mol.% of S1O2, 17.3 mol.% of AI2O3, 9.9 mol.% of SrO, 7.4 mol.% of P2O5, 4.6 mol.% of K2O, and 0.02 mol.% of SnCh. This exemplary composition includes P2O5 other than B2O3. The results of this exemplary glass composition are used for illustration only. The glass compositions provided in the present disclosure provide similar or the same results.

[00108] In FIGS. 3A-3B, the K content of the film was measured after the following heat treatment conditions: no heat treatment (control), 450°C for 60 min, 550°C for 40 min, and 650°C for 20 min. These heat treatment conditions were chosen at realistic times and temperatures for customer processes. High purity fused silica (HPFS) was also measured three times to determine the endemic K contamination in the environment to provide a baseline for adsorbed surface K. The detection limit of the SIMS measurement is 0.002 mol. % K. As shown in FIGS. 3A-3B, the K contents in the SiO film and the SiN film deposited on an exemplary glass substrate were below the detection limit without any heat treatment or after different heat treatments. The results illustrate no significant diffusion of potassium from the glass composition into the films deposited thereon. [00109] Although the subject matter has been described in terms of exemplary embodiments, it is not limited thereto. Rather, the appended claims should be construed broadly, to include other variants and embodiments, which may be made by those skilled in the art.