Title:
ALKOXIDE COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION AND PROCESS FOR PRODUCING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2005/085175
Kind Code:
A1
Abstract:
An alkoxide compound that is represented by the following general formula (I) and is suitable to a raw material for thin film formation for use in a process of thin film formation though compound evaporation, such as CVD process. Further, there is provided a raw material for thin film formation comprising the above alkoxide compound. Still further, there is provided a process for producing a thin film, comprising vaporizing the above raw material for thin film formation to thereby obtain a vapor containing the alkoxide compound, introducing the vapor onto a substratum, and performing decomposition and/or chemical reaction thereof to thereby form a thin film on the substratum. (I) (wherein one of R1 and R2 is a C1-C4 alkyl while the other is a hydrogen atom or C1-C4 alkyl; each of R3 and R4 is a C1-C4 alkyl; A is a C1-C8 alkanediyl; M is a silicon or hafnium atom; and n is 4).
Inventors:
SATO HIROKI (JP)
SAKURAI ATSUSHI (JP)
SAKURAI ATSUSHI (JP)
Application Number:
PCT/JP2005/002118
Publication Date:
September 15, 2005
Filing Date:
February 14, 2005
Export Citation:
Assignee:
ASAHI DENKA CO LTD (JP)
SATO HIROKI (JP)
SAKURAI ATSUSHI (JP)
SATO HIROKI (JP)
SAKURAI ATSUSHI (JP)
International Classes:
C07C215/08; C23C16/40; H01L21/316; C07F7/00; C07F7/04; (IPC1-7): C07C215/08; C23C16/40; H01L21/316
Other References:
MEHROTRA R. ET AL: "Aminoalkoxysilanes. I. Amino derivatives of alkoxy-and alkylalkoxysilanes.", JOURNAL OF ORGANOMETALLIC CHEMISTRY., vol. 24, no. 3, 1970, pages 611 - 621, XP002990912
ABBOTT A. D. ET AL: "Silicate esters and related compounds.", JOURNAL OF CHEMICAL AND ENGINEERING DATA., vol. 6, 1961, pages 437 - 442, XP002990913
SONG M.K. ET AL: "Direct liquid injection metal-organic chemical vapor deposotion of HF02 thin films using HF(dimethylaminoethoxide)4.", THIN SOLID FILMS., vol. 450, no. 2, 2004, pages 272 - 275, XP004492142
ABBOTT A. D. ET AL: "Silicate esters and related compounds.", JOURNAL OF CHEMICAL AND ENGINEERING DATA., vol. 6, 1961, pages 437 - 442, XP002990913
SONG M.K. ET AL: "Direct liquid injection metal-organic chemical vapor deposotion of HF02 thin films using HF(dimethylaminoethoxide)4.", THIN SOLID FILMS., vol. 450, no. 2, 2004, pages 272 - 275, XP004492142
Attorney, Agent or Firm:
Hatori, Osamu (8-6 Akasaka 1-chome, Minato-k, Tokyo 52, JP)
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