Title:
ALUMINA FILM SUBSTRATE AND ITS FABRICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2007/029754
Kind Code:
A1
Abstract:
An alumina film substrate has its surface that is so flat that an inspection of the surface by high-speed electron diffraction results in a banded pattern. A method for fabricating the alumina film substrate comprises a step for forming an epitaxial alumina film in such a way that after the surface of the substrate including aluminum is polished so as to be flattened, the substrate is heated in an oxygen atmosphere, thereby segregating the aluminum included in the substrate to the surface. There is provided a tunnel barrier material for forming a tunnel barrier layer having a uniform thin-film thickness, having an excellent breakdown resistance so that tunnel current is made to flow without causing a dielectric breakdown even if a voltage exceeding 5 × 109 V/m is applied, and not causing tunnel current fluctuations depending on the place. The tunnel barrier material can improve the operation efficiency, reliability, and lifetime, when it is applied to various elements using tunnel currents.
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Inventors:
YOSHITAKE, Michiko (2-1 Sengen 1-chome Tsukuba-sh, Ibaraki 47, 3050047, JP)
吉武 道子 (〒47 茨城県つくば市千現１丁目２番１号 独立行政法人物質・材料研究機構内 Ibaraki, 3050047, JP)
吉武 道子 (〒47 茨城県つくば市千現１丁目２番１号 独立行政法人物質・材料研究機構内 Ibaraki, 3050047, JP)
Application Number:
JP2006/317678
Publication Date:
March 15, 2007
Filing Date:
September 06, 2006
Export Citation:
Assignee:
NATIONAL INSTITUTE FOR MATERIALS SCIENCE (2-1 Sengen 1-chome, Tsukuba-shi Ibaraki, 47, 3050047, JP)
独立行政法人物質・材料研究機構 (〒47 茨城県つくば市千現１丁目２番１号 Ibaraki, 3050047, JP)
YOSHITAKE, Michiko (2-1 Sengen 1-chome Tsukuba-sh, Ibaraki 47, 3050047, JP)
独立行政法人物質・材料研究機構 (〒47 茨城県つくば市千現１丁目２番１号 Ibaraki, 3050047, JP)
YOSHITAKE, Michiko (2-1 Sengen 1-chome Tsukuba-sh, Ibaraki 47, 3050047, JP)
International Classes:
C30B29/20; H01L21/314; H01L21/8242; H01L21/8246; H01L27/105; H01L27/108; H01L29/78; H01L43/08; H01L43/10; C30B29/10; H01L21/02; H01L21/70; H01L27/105; H01L27/108; H01L29/66; H01L43/00; H01L43/08
Attorney, Agent or Firm:
NISHIZAWA, Toshio (Three F Minami Aoyama Bldg. 7F, 11-1 Minami-Aoyama 6-chom, Minato-ku Tokyo 62, 1070062, JP)
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