Title:
ALUMINUM ALLOY, AND SEMICONDUCTOR PRODUCTION DEVICE AND PLASMA TREATMENT DEVICE EACH MANUFACTURED USING SAME
Document Type and Number:
WIPO Patent Application WO/2015/060331
Kind Code:
A1
Abstract:
An aluminum alloy according to the present invention comprises, in wt%, 2.0 to 3.5% of Mg, 0.001 to 0.01% of Cr or 0.005 to 0.01% of Mn, and 0.001 to 0.04% of Ti, with the remainder made up by 0.01% or less of unavoidable impurities and Al.
Inventors:
HASUO SHUNJI (JP)
Application Number:
PCT/JP2014/078043
Publication Date:
April 30, 2015
Filing Date:
October 22, 2014
Export Citation:
Assignee:
KYUSHU MITSUI ALUMINIUM CO LTD (JP)
International Classes:
C22C21/06; C22C21/08; C23C14/00; C23C16/44; H01L21/02
Foreign References:
| JP2004099972A | 2004-04-02 | |||
| JPH1088271A | 1998-04-07 | |||
| JPH08269599A | 1996-10-15 | |||
| JP2003171727A | 2003-06-20 | |||
| JP2003119540A | 2003-04-23 | |||
| JP2003119539A | 2003-04-23 | |||
| JP2002256488A | 2002-09-11 |
Attorney, Agent or Firm:
MATSUO KENICHIRO (JP)
Ken-ichiro Matsuo (JP)
Ken-ichiro Matsuo (JP)
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