Title:
ALUMINUM-CONTAINING FILM LAYER PATTERN, MANUFACTURING METHOD THEREOF, AND POST-PROCESSING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/036387
Kind Code:
A1
Abstract:
The invention discloses an aluminum-containing film layer pattern, manufacturing method thereof, and post-processing method thereof. The manufacturing method uses a patterned photoresist layer (320) as mask to cover an aluminum-containing film layer (310) to be patterned. A chlorine-containing gas is used on the film layer (310) to perform a dry-etching process and to form a patterned film layer. Subsequently, dechlorination and the removal of a carrier substrate (200) are performed simultaneously on the formed aluminum-containing patterned film layer (310). The method increases productivity and reduces costs.
Inventors:
HUO XIAODI (CN)
WU GUOTE (CN)
LEE SOONDONG (CN)
LEE JIHOON (CN)
WU GUOTE (CN)
LEE SOONDONG (CN)
LEE JIHOON (CN)
Application Number:
PCT/CN2017/096832
Publication Date:
March 01, 2018
Filing Date:
August 10, 2017
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
H01L21/3213
Foreign References:
| CN104916534A | 2015-09-16 | |||
| CN101752207A | 2010-06-23 | |||
| CN103545163A | 2014-01-29 | |||
| CN104716072A | 2015-06-17 | |||
| JPH08148466A | 1996-06-07 | |||
| CN106206290A | 2016-12-07 |
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
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