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Title:
AMINE TREATED MALEIC ANHYDRIDE POLYMERS WITH PENDENT SILYL GROUP, COMPOSITIONS AND APPLICATIONS THEREOF
Document Type and Number:
WIPO Patent Application WO/2015/038412
Kind Code:
A3
Abstract:
Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units containing pendent silyl groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

Inventors:
KANDANARACHCHI, Pramod (9921 Brecksville Road, Brecksville, OH, 44141, US)
RHODES, Larry (9921 Brecksville Road, Brecksville, OH, 44141, US)
Application Number:
US2014/054183
Publication Date:
July 16, 2015
Filing Date:
September 05, 2014
Export Citation:
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Assignee:
PROMERUS, LLC (9921 Brecksville Road, Brecksville, OH, 44141, US)
International Classes:
C08F232/00; C08F8/12; C08F8/32; C08F8/44; C08F8/48; C08F210/00; C08F212/02; C08F222/04; C08F230/08; C08J5/18; C09D123/36; C09D135/00; C09D143/04; C09D145/00; G03F7/004; H01L21/027; C08F222/06; C08F232/04
Domestic Patent References:
WO2004068243A12004-08-12
Other References:
TSONG-SHIN JEAN ET AL: "Silicon Containing Photoresists.", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 14, no. 3, 1 January 2001 (2001-01-01), pages 503 - 506, XP055159898, ISSN: 0914-9244, DOI: 10.2494/photopolymer.14.503
Attorney, Agent or Firm:
GUPTA, Balaram (Promerus, LLC9921 Brecksville Roa, Brecksville OH, 44141, US)
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