Title:
AMINO COMPOUND, POLYAMIDE ACID AND POLYIMIDE USING SAID AMINO COMPOUND, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2023/189319
Kind Code:
A1
Abstract:
Provided are: an amino compound which can realize reduced dielectric loss tangent of a cured product of resin composition; a polyamide acid and a polyimide using the amino compound; and a method for producing the same. The present invention is an amino compound which has at least two substituents comprising a structure represented by general formula (1) and which also has at least two primary amino groups bonded to a methylene group. (In formula (1), X indicates a bonding position.)
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Inventors:
CHIBA MASAYUKI (JP)
KOBAYASHI TETSUYA (JP)
SHIMIZU TAKEHIRO (JP)
NAGAYASU ANNA (JP)
FUJIWARA TAKUMA (JP)
ITAI MOTOKAZU (JP)
KOBAYASHI TETSUYA (JP)
SHIMIZU TAKEHIRO (JP)
NAGAYASU ANNA (JP)
FUJIWARA TAKUMA (JP)
ITAI MOTOKAZU (JP)
Application Number:
PCT/JP2023/008784
Publication Date:
October 05, 2023
Filing Date:
March 08, 2023
Export Citation:
Assignee:
NIPPON STEEL CHEMICAL & MAT CO LTD (JP)
International Classes:
C07C209/48; C07C211/09; C08G73/10
Domestic Patent References:
| WO2018061727A1 | 2018-04-05 |
Foreign References:
| JP2016521251A | 2016-07-21 |
Other References:
SACHIE UCHIDA, YUICHIRO KOMATSU, HITOMI SATOH, SETSUKO YAJIMA, KEIICHI KIMURA, YOSHITO TOBE, SHIN-ICHI SASAKI, MASAAKI MIZUNO, YOH: "Properties of dendritic and cyclic thiourea derivatives as neutral carriers for anion sensors", BUNSEKI KAGAKU, NIPPON BUNSEKI KAGAKKAI , TOKYO, JP, vol. 53, no. 9, 1 January 2004 (2004-01-01), JP , pages 943 - 952, XP008152815, ISSN: 0525-1931, DOI: 10.2116/bunsekikagaku.53.943
JERMAN, I. ; OREL, B. ; `URCA VUK, A. ; KO~ELJ, M. ; KOVA, J.: "A structural and corrosion study of triethoxysilyl and perfluorooctyl functionalized polyhedral silsesquioxane nanocomposite films on AA 2024 alloy", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, vol. 518, no. 10, 1 March 2010 (2010-03-01), AMSTERDAM, NL , pages 2710 - 2721, XP026903598, ISSN: 0040-6090, DOI: 10.1016/j.tsf.2009.10.023
JERMAN, I. ; KO~ELJ, M. ; OREL, B.: "The effect of polyhedral oligomeric silsesquioxane dispersant and low surface energy additives on spectrally selective paint coatings with self-cleaning properties", SOLAR ENERGY MATERIALS AND SOLAR CELLS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM., NL, vol. 94, no. 2, 1 February 2010 (2010-02-01), NL , pages 232 - 245, XP026815527, ISSN: 0927-0248
MCCARTNEY C.M.; COWLAM N.; DAVIS F.; RICHARDSON T.; DESERT A.; GIBAUD A.; STIRLING C.J.M.: "On the layer structures in acid- and amine-substituted calixarene Langmuir–Blodgett f", COLLOIDS AND SURFACES A : PHYSIOCHEMICAL AND ENGINEERINGS ASPECTS, ELSEVIER, AMSTERDAM, NL, vol. 436, 14 June 2013 (2013-06-14), AMSTERDAM, NL , pages 41 - 48, XP028735065, ISSN: 0927-7757, DOI: 10.1016/j.colsurfa.2013.06.006
JERMAN, I. ; OREL, B. ; `URCA VUK, A. ; KO~ELJ, M. ; KOVA, J.: "A structural and corrosion study of triethoxysilyl and perfluorooctyl functionalized polyhedral silsesquioxane nanocomposite films on AA 2024 alloy", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, vol. 518, no. 10, 1 March 2010 (2010-03-01), AMSTERDAM, NL , pages 2710 - 2721, XP026903598, ISSN: 0040-6090, DOI: 10.1016/j.tsf.2009.10.023
JERMAN, I. ; KO~ELJ, M. ; OREL, B.: "The effect of polyhedral oligomeric silsesquioxane dispersant and low surface energy additives on spectrally selective paint coatings with self-cleaning properties", SOLAR ENERGY MATERIALS AND SOLAR CELLS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM., NL, vol. 94, no. 2, 1 February 2010 (2010-02-01), NL , pages 232 - 245, XP026815527, ISSN: 0927-0248
MCCARTNEY C.M.; COWLAM N.; DAVIS F.; RICHARDSON T.; DESERT A.; GIBAUD A.; STIRLING C.J.M.: "On the layer structures in acid- and amine-substituted calixarene Langmuir–Blodgett f", COLLOIDS AND SURFACES A : PHYSIOCHEMICAL AND ENGINEERINGS ASPECTS, ELSEVIER, AMSTERDAM, NL, vol. 436, 14 June 2013 (2013-06-14), AMSTERDAM, NL , pages 41 - 48, XP028735065, ISSN: 0927-7757, DOI: 10.1016/j.colsurfa.2013.06.006
Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
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