AMORPHOUS BORON NITRIDE THIN FILM AND METHOD FOR PRODUCING SAME, MULTILAYER FILM, TRANSPARENT PLASTIC FILM, AND ORGANIC EL DEVICE

Title:

AMORPHOUS BORON NITRIDE THIN FILM AND METHOD FOR PRODUCING SAME, MULTILAYER FILM, TRANSPARENT PLASTIC FILM, AND ORGANIC EL DEVICE

Document Type and Number:

WIPO Patent Application WO/2005/035824

Kind Code:

A1

Abstract:

A method for producing an amorphous boron nitride thin film is characterized in that a thin film having a composition represented by the general formula (1) below is formed by supplying a reactive gas between opposing electrodes, applying a high-frequency voltage thereto for exciting the reactive gas, and exposing a base to the excited reactive gas at or near atmospheric pressure. General formula (1) BN_xC_y:H (In the formula, x and y satisfy: 0.7 ≤ x ≤ 1.3, 0 ≤ y ≤ 1.5.)

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Inventors:

OKUBO YASUSHI (JP)

Application Number:

PCT/JP2004/014676

Publication Date:

April 21, 2005

Filing Date:

September 29, 2004

Export Citation:

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Assignee:

KONICA MINOLTA HOLDINGS INC (JP)
OKUBO YASUSHI (JP)

International Classes:

C23C16/34; C23C16/36; (IPC1-7): C23C16/38; C23C16/505

Domestic Patent References:

WO2002048428A1

2002-06-20

Foreign References:

JPH0841633A	1996-02-13
JP2003282237A	2003-10-03
JP2002117973A	2002-04-19
JPH05239648A	1993-09-17
JP3059002B2	2000-07-04
JPH062938B2	1994-01-12

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