Title:
ANALYSIS TOOL AND MICROANALYSIS SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/011262
Kind Code:
A1
Abstract:
Disclosed is an analysis tool which suppresses background and has improved sample detection sensitivity. In a first plate (11) is formed a first concavity (13) having, in the path of excitation light of a surface opposite to a bonding surface (20), a first bottom surface (13a), a first opening (13b), and a slanted surface (13c) which widens from the outer edge of the first bottom surface (13a) towards the edge of the first opening (13b). In a second plate (12), which has a flow path through which a sample flows formed on the bonding surface (20), is formed a second concavity (14) having, in the path of excitation light of a surface opposite to the bonding surface, a second bottom surface (14a), a second opening (14b), and a slanted surface (14c) which widens from the outer edge of the second bottom surface (14a) towards the edge of the second opening (14b). In the disclosed analysis tool (10), the first plate (11) is bonded to the second plate (12), and the first opening (13b) and the second opening (14b) are covered with a film (21, 22).
Inventors:
ONO, Koichi (())
Application Number:
JP2011/004054
Publication Date:
January 26, 2012
Filing Date:
July 15, 2011
Export Citation:
Assignee:
Enplas Corporation (2-30-1, Namiki Kawaguchi-sh, Saitama 34, 〒3320034, JP)
株式会社エンプラス (〒34 埼玉県川口市並木２丁目３０番１号 Saitama, 〒3320034, JP)
株式会社エンプラス (〒34 埼玉県川口市並木２丁目３０番１号 Saitama, 〒3320034, JP)
International Classes:
G01N21/64; G01N21/05; G01N37/00
Attorney, Agent or Firm:
WASHIDA, Kimihito (8th Floor, Shinjuku First West Bldg. 1-23-7, Nishi-Shinjuku, Shinjuku-k, Tokyo 23, 〒1600023, JP)
Claims: