Title:
ANTENNA FOR GENERATING PLASMA, AND PLASMA TREATMENT DEVICE AND ANTENNA STRUCTURE PROVIDED WITH ANTENNA FOR GENERATING PLASMA
Document Type and Number:
WIPO Patent Application WO/2018/151114
Kind Code:
A1
Abstract:
The purpose of the present invention is to reduce the impedance of an antenna and eliminate the gaps between a dielectric body and electrodes constituting a capacitance element. An antenna (3) for generating inductively coupled plasma (P), wherein: the antenna (3) comprises at least two conductor elements (31), an insulation element (32) that is provided between the mutually adjacent conductor elements (31) and that insulates the conductor elements (31), and a capacitance element (33) directly and electrically connected to the mutually adjacent conductor elements (31); and the capacitance element (33) is configured from a first electrode (33A) electrically connected to one of the mutually adjacent conductor elements (21), a second electrode (33B) electrically connected to the other of the mutually adjacent conductor elements (31), and a liquid dielectric body filling the space between the first electrode (33A) and the second electrode (33B).
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Inventors:
ANDO YASUNORI (JP)
LI DONGWEI (JP)
KUBOTA KIYOSHI (JP)
LI DONGWEI (JP)
KUBOTA KIYOSHI (JP)
Application Number:
PCT/JP2018/004939
Publication Date:
August 23, 2018
Filing Date:
February 13, 2018
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/509; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2009142016A1 | 2009-11-26 |
Foreign References:
| JP2002510841A | 2002-04-09 | |||
| JP2016072168A | 2016-05-09 | |||
| JP2013206652A | 2013-10-07 | |||
| US20110018443A1 | 2011-01-27 | |||
| US20050067934A1 | 2005-03-31 |
Attorney, Agent or Firm:
NISHIMURA, Ryuhei (JP)
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