Title:
ANTENNA FOR PLASMA GENERATION, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/089007
Kind Code:
A1
Abstract:
Provided is an antenna for plasma generation that is for generating surface wave plasma by radiating microwaves, which are transmitted in a coaxial waveguide tube, within a processing vessel and forming a gas borne on the metal surfaces of the processing vessel into plasma. The antenna for plasma generation is provided with: a gas route in which gas flows within the antenna for plasma generation; a plurality of gas holes linked to the gas route and introducing gas that has passed through the gas route into the processing vessel; and a plurality of slots passing through the gas route in a state separated from the gas route and through which microwaves that are transmitted through a slow wave plate via the coaxial waveguide tube pass and are radiated within the processing vessel. A space (WA) between adjacent slots, which is a part that passes through the gas route, is wider than a space (WB), which is a part that opens to a plasma generating space within the processing vessel.
Inventors:
KOMATSU TOMOHITO (JP)
IKEDA TARO (JP)
KASAI SHIGERU (JP)
IKEDA TARO (JP)
KASAI SHIGERU (JP)
Application Number:
PCT/JP2012/081570
Publication Date:
June 20, 2013
Filing Date:
December 05, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2010090058A1 | 2010-08-12 |
Foreign References:
| JP2010277971A | 2010-12-09 | |||
| JP2009205921A | 2009-09-10 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
Tadashige Ito (JP)
Tadashige Ito (JP)
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