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Patent Searching and Data


Title:
ANTENNA, AND PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/177037
Kind Code:
A1
Abstract:
The purpose of the present invention is to inhibit an antenna from deflecting even when the antenna is long, and to generate a plasma that is uniform in the longitudinal direction of the antenna, thereby increasing reliability. An antenna 3 for generating a plasma upon having a high-frequency current channelled therethrough, wherein a pair of conductor elements 31 are screwed to an insulating element 32 interposed therebetween, either the insulating element 32 or the conductor elements 31 has an outward-facing surface 34 provided at a different location than a screw part, and the other of the insulating element 32 or the conductor elements 31 has an inward-facing surface 35 in contact with the outward-facing surface 34.

Inventors:
IBARAKI MITSUO (JP)
Application Number:
JP2019/010311
Publication Date:
September 19, 2019
Filing Date:
March 13, 2019
Export Citation:
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Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/509; H01L21/205; H01L21/3065; H01L21/31
Domestic Patent References:
WO2011041087A22011-04-07
Foreign References:
JP2016138598A2016-08-04
JP2015508565A2015-03-19
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