ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING SAME

Title:

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING SAME

Document Type and Number:

WIPO Patent Application WO/2021/167408

Kind Code:

A1

Abstract:

The present invention relates to an antenna structure for receiving an alternating current power to induce plasma into a chamber, the antenna structure comprising: first and second antenna segments arranged on a first plane intersecting a virtual central axis to have a first radius of curvature and a second radius of curvature with respect to the central axis; and a first capacitive load electrically connecting the first and second antenna segments to each other in series, wherein, when the first antenna segment extends from one end of the first capacitive load by a first length while having the first radius of curvature, the second antenna segment extends from the other end of the first capacitive load by a second length corresponding to the first length while having the second radius of curvature, and the sum of the first length and the second length is shorter than a circumference having a diameter which is the first radius of curvature or the second radius of curvature.

Inventors:

UHM SAE HOON (KR)
LEE YUN SEONG (KR)
SOHN YEONG HOON (KR)
PARK SE HONG (KR)

Application Number:

PCT/KR2021/002139

Publication Date:

August 26, 2021

Filing Date:

February 19, 2021

Export Citation:

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Assignee:

EN2CORE TECH INC (KR)

International Classes:

H01J37/32; H01Q1/26

Foreign References:

KR20020096259A	2002-12-31
KR20020007155A	2002-01-26
JP2004532506A	2004-10-21
KR20090027479A	2009-03-17
US5436528A	1995-07-25

Other References: