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Title:
ANTI-REFLECTION FILM AND OPTICAL MEMBER PROVIDED WITH ANTI-REFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/2016/031167
Kind Code:
A1
Abstract:
[PROBLEM] To provide an anti-reflection film that can be manufactured with high productivity and has sufficient optical properties, and an optical member provided with the anti-reflection film. [SOLUTION] An anti-reflection film provided on the surface of a translucent substrate, the film comprising, laminated in order from the side of the substrate (5): a thin-film multilayer film (20) which comprises a plurality of layers; and a minute projection-recess layer (30) which comprises a projection-recess structure formed so as to have an average pitch that is shorter than the wavelength of used light, and in which the refractive index with respect to the used light continuously changes in accordance with the continuous change in the spatial occupancy in the thickness direction of the projection-recess structure, wherein included in the plurality of layers are an oxynitriding film (22) having a relatively low refractive index, and an oxidation film (21) that has a relatively high refractive index, and that has at least two kinds of metallic element, or, silicon and at least one kind of metallic element.

Inventors:
SONODA SHINICHIRO (JP)
YOSHIHIRO TATSUYA (JP)
TAKAHASHI HIROKI (JP)
KANAYA MOTOTAKA (JP)
Application Number:
PCT/JP2015/004053
Publication Date:
March 03, 2016
Filing Date:
August 14, 2015
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B1/115; B32B3/30; B32B7/02; B32B9/00
Foreign References:
JP2014081522A2014-05-08
JP2000160331A2000-06-13
JPS6480904A1989-03-27
JP2014098885A2014-05-29
JP2014021146A2014-02-03
Other References:
M. SERENYI ET AL.: "Refractive index of sputtered silicon oxynitride layers for antireflection coating", VACUUM, vol. 61, 2001, pages 245 - 249
Attorney, Agent or Firm:
YANAGIDA, Masashi et al. (JP)
Seiji Yanagida (JP)
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