Title:
ANTI-REFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/2008/010376
Kind Code:
A1
Abstract:
An anti-reflection film comprising a transparent substrate and at least a low-refractive-index layer provided on the substrate directly or through other layer, wherein the low-refractive-index layer comprises at least two silica microparticles, one of the silica microparticles is a hollow silica microparticle having a porous or hollow interior, another one of the silica microparticles is colloidal silica having an average particle diameter of not less than 1.1 times and less than 20 times that of the hollow silica microparticles, and the outermost surface of the film has an arithmetic average roughness (Ra) of not less than 40 and less than 500 nm.
Inventors:
REN, Rieko (Inc. 2970 Ishikawa-machi, Hachioji-sh, Tokyo 05, 1928505, JP)
Application Number:
JP2007/062299
Publication Date:
January 24, 2008
Filing Date:
June 19, 2007
Export Citation:
Assignee:
Konica Minolta Opto, Inc. (2970, Ishikawa-machi Hachioji-sh, Tokyo 05, 1928505, JP)
コニカミノルタオプト株式会社 (〒05 東京都八王子市石川町２９７０番地 Tokyo, 1928505, JP)
コニカミノルタオプト株式会社 (〒05 東京都八王子市石川町２９７０番地 Tokyo, 1928505, JP)
International Classes:
G02B1/11; B32B7/02; G02B1/10; G02B1/10; B32B7/02
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