ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS

Title:

ANTI-REFLECTIVE COATINGS AND DUAL DAMASCENE FILL COMPOSITIONS COMPRISING STYRENE-ALLYL ALCOHOL COPOLYMERS

Document Type and Number:

WIPO Patent Application WO2004040369

Kind Code:

A3

Abstract:

New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

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Inventors:

XU GU
MEADOR JIMMY D
BHAVE MANDAR R
DESHPANDE SHREERAM V
NOWAK KELLY A

Application Number:

PCT/US2003/015164

Publication Date:

July 08, 2004

Filing Date:

May 13, 2003

Export Citation:

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Assignee:

BREWER SCIENCE INC (US)

International Classes:

C09D101/00; C09D129/08; G02B1/11; G03F7/09; H01L21/768; (IPC1-7): C08F12/02; C08F16/36; C08F20/10; C08F212/00

Foreign References:

EP0458772A2	1991-11-27
US3454418A	1969-07-08
US4808652A	1989-02-28

Other References: