ANTI-REFLECTIVE UNDERLAYER COMPOSITION

WIPO Patent Application WO/2010/064829

A3

The present invention relates to an underlayer composition having anti-reflective properties useful in a lithographic process. The composition according to the present invention has highly outstanding optical and mechanical characteristics and a high etching selectivity ratio, while at the same time having the feature that coating can be carried out using the spin-on coating technique. Advantageously, the composition of the present invention is used in relatively short wavelength lithography and has a minimal residual acid content.

WO/1999/020711	POLYMERIC MATERIALS FOR ELECTROLUMINESCENT DEVICES
JPH0725868	[Title of Invention] A precursor of long-chain substituted polyphenylene vinylene, a method for producing long-chain substituted polyphenylene vinylene, and a highly conductive composition.
JP2006249229	POLYMER HAVING LUMINOUS UNIT EMITTING LIGHT AFTER CHANGE IN CHEMICAL STRUCTURE AND ORGANIC ELECTROLUMINESCENT ELEMENT USING THE SAME

YOON KYONG-HO (KR)
LEE JIN-KUK (KR)
CHEON HWAN-SUNG (KR)
KIM MIN-SOO (KR)
SONG JEE-YUN (KR)

PCT/KR2009/007120

August 26, 2010

December 01, 2009

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CHEIL IND INC (KR)
YOON KYONG-HO (KR)
LEE JIN-KUK (KR)
CHEON HWAN-SUNG (KR)
KIM MIN-SOO (KR)
SONG JEE-YUN (KR)

C08G61/02; C08G61/00; C08L65/00; G03F7/004

WO2008082241A1	2008-07-10
WO2006126776A1	2006-11-30

KR100836675B1	2008-06-10
JP2000352821A	2000-12-19
KR100671120B1	2007-01-17

PANKOREA PATENT AND LAW FIRM (649-10Yoksam-dong, Kangnam-ku, Seoul 135-080, KR)

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