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Title:
ANTIFOGGING AGENT COMPOSITION, AND ANTIFOGGING ARTICLE
Document Type and Number:
WIPO Patent Application WO/2023/054457
Kind Code:
A1
Abstract:
An antifogging agent composition which contains a copolymer (A), colloidal silica (B) and a solvent (C), wherein: (A) is a (meth)acrylate copolymer obtained from a monomer mixture which contains monomers (a-1) to (a-3); (C) contains water (C-1), a C1-4 monovalent alcohol-based solvent (C-2), a solvent (C-3) which has one or more functional groups per molecule which are selected from the group consisting of a ketone group, an ester group, two or more ether groups, a thioketone group and an amide group, and has a boiling point of 100-200°C, inclusive, and a glycol ether-based solvent (C-4) which is represented by general formula (5) (R10-O-R11-OH); and the combined total of (C-1) to (C-4) relative to 100 parts by mass of the combined total of (A) and (B), and the mass ratios of (C-3) and (C-4) relative thereto, are specific amounts. Said antifogging agent composition makes it possible to form an antifogging coating which exhibits excellent transparency, water resistance, initial adhesiveness, antifogging properties, and repeated antifogging properties, is unlikely to have water droplet marks left thereon, and also suppresses the formation of liquid droplets when applying the coating, is adhesive after pre-drying when applying a thin film of the coating, and suppresses the formation of cracks when applying a thick film thereof.

Inventors:
TAKAHASHI YUKI (JP)
NITO YOSHINORI (JP)
KANO TAKAMITSU (JP)
Application Number:
PCT/JP2022/036131
Publication Date:
April 06, 2023
Filing Date:
September 28, 2022
Export Citation:
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Assignee:
NOF CORP (JP)
International Classes:
C09D5/00; C09D7/20; C09D7/61; C09D133/14; C09D133/26; C09K3/18
Domestic Patent References:
WO2019163918A12019-08-29
Foreign References:
JP2016155923A2016-09-01
JP2015129248A2015-07-16
JP2018150470A2018-09-27
JP2017165878A2017-09-21
JP2019006881A2019-01-17
JP2018002865A2018-01-11
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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