Title:
ANTIMICROBIAL COMPOSITION COMPRISING ANTISEPTIC COMPOUND AND REUTERIN, AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2023/075165
Kind Code:
A1
Abstract:
The present invention relates to an antimicrobial composition, a cosmetic composition, and a preservative for preserving cosmetics, the antimicrobial composition comprising an antiseptic compound and reuterin in order to inhibit microbial activity or kill microorganisms. The antimicrobial composition comprises the antiseptic compound and reuterin and thus may be used as a cosmetic composition, a preservative for preserving cosmetics, etc. whereby the amount of use of the antiseptic compound is minimized, and thus formulation stability may be improved, and the amount of use may be reduced compared to when using reuterin alone, and thus antimicrobial activity in the formulation may be secured, and thus disadvantages of the antiseptic compound or reuterin are compensated for.
Inventors:
LEE KYUNG MIN (KR)
LEE WOO JUNG (KR)
LEE MI YOUNG (KR)
LEE GIL YONG (KR)
PARK JAE HYUNG (KR)
LEE JU HUN (KR)
CHO HEE WON (KR)
LEE WOO JUNG (KR)
LEE MI YOUNG (KR)
LEE GIL YONG (KR)
PARK JAE HYUNG (KR)
LEE JU HUN (KR)
CHO HEE WON (KR)
Application Number:
PCT/KR2022/014266
Publication Date:
May 04, 2023
Filing Date:
September 23, 2022
Export Citation:
Assignee:
KOLON INC (KR)
International Classes:
A61K8/35; A61K8/34; A61K8/368; A61K8/37; A61Q17/00; A61Q19/00
Foreign References:
| JPH08256746A | 1996-10-08 | |||
| JPH08289769A | 1996-11-05 | |||
| US20190343894A1 | 2019-11-14 | |||
| US20160271189A1 | 2016-09-22 | |||
| US20070264401A1 | 2007-11-15 | |||
| KR102394120B1 | 2022-05-04 |
Attorney, Agent or Firm:
PARK, Hyuk (KR)
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