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Patent Searching and Data


Title:
ANTIMICROBIAL PHOTOCURING 3D PRINTING MATERIAL AND PREPARATION METHOD THEREFOR AND 3D PRINTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/042669
Kind Code:
A1
Abstract:
Provided in the present invention is an antimicrobial photocuring 3D printing material, the material comprising the following components in parts by weight: 100 parts by weight of biocompatible oligomers/monomers, 0.05-5 parts by weight of supramolecular photoinitiator systems, 5-30 parts by weight of antimicrobial agents, and 1-20 parts by weight of auxiliaries, wherein the supramolecular photoinitiator systems are active supramolecular compounds under light radiation of a visible light waveband.

Inventors:
CUI KEJIAN (CN)
LI YI (CN)
Application Number:
PCT/CN2019/086934
Publication Date:
March 05, 2020
Filing Date:
May 15, 2019
Export Citation:
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Assignee:
YLX INC (CN)
International Classes:
B29C67/00; C08F283/10; B33Y30/00; B33Y70/00; C08F283/00; C08K3/08; C08K3/22; C08K3/34; C08K5/06; C08K5/08; C08K5/14
Foreign References:
CN107312133A2017-11-03
CN205668388U2016-11-02
CN107522827A2017-12-29
CN106167537A2016-11-30
CN108329437A2018-07-27
CN108455966A2018-08-28
US20160279868A12016-09-29
Other References:
JING ZHANG: "Structure Design of Naphthalimide Derivatives: Toward Versa- tile Photoinitiators for Near-UV/Visible LEDs, 3D Printing, and Water-So- luble Photoinitiating Systems", MACROMOLECULES, 10 April 2015 (2015-04-10), pages 2054 - 2063, XP055529860
SONG, XIAOYAN ET AL.: "3D Printing Technology Based on Two-photon Polymerization", CIESC JOURNAL, 30 September 2015 (2015-09-30), pages 3324 - 3332
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