ANTIMONY-DOPED TIN OXIDE POWDER AND PROCESS FOR MANUFACTURING SAME

WIPO Patent Application WO/2013/147029

A1

This antimony-doped tin oxide powder is characterized by: (A) comprising at least three kinds of ions selected from the group consisting of Sn2+, Sn4+, Sb3+ and Sb5+; (B) having a ratio of average Sn ion radius to average Sb ion radius of 1 : (0.96 to 1.04); and (C) having an Sb content of 5 to 25mol relative to 100mol of the sum total of Sb and Sn. The average Sn ion radius is the average of ion radiuses of Sn2+ and Sn4+, while the average Sb ion radius is the average of ion radiuses of Sb3+ and Sb5+.

JPH11310415	HIGHLY PURE TIN OXIDE AND ITS PRODUCTION
JP2008091215	TIN OXIDE FILM FORMER, TIN OXIDE FILM FORMATION METHOD USING IT, AND TIN OXIDE FILM FORMED BY IT

SHIRAISHI SHINYA (JP)
UMEDA HIROTOSHI (JP)
SASAKI SUZUO (JP)

PCT/JP2013/059276

October 03, 2013

March 28, 2013

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MITSUBISHI MATERIALS CORP (JP)
MITSUBISHI MAT ELECT CHEM CO (JP)

C01G19/02; C01G19/00; C01G30/00; C09C3/06; C09D5/32; C09D7/62; C09D201/00

WO2008127409A2

2008-10-23

JP2004083397A	2004-03-18
JP2004149329A	2004-05-27
JP2003176132A	2003-06-24
JPH0769632A	1995-03-14
JPH10251018A	1998-09-22
JPS5891777A	1983-05-31
JPS5891777A	1983-05-31

I.S. MULLA ET AL.: "Electron spectroscopic studies on films of Sn02 and Sn02:Sb", SURFACE AND COATINGS TECHNOLOGY, vol. 31, 1987, pages 77 - 88, XP024461067
SEUNG-YUP LEE ET AL.: "Structural, electrical and optical characteristics of Sn02:Sb thin films by ultrasonic spray pyrolysis", THIN SOLID FILMS, vol. 510, 3 February 2006 (2006-02-03), pages 154 - 158, XP025006926

SHIGA Masatake et al. (JP)
Masatake Shiga (JP)

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