Title:
ANTIREFLECTION STRUCTURE, SUBSTRATE WITH ANTIREFLECTION STRUCTURE, CAMERA MODULE, AND INFORMATION TERMINAL DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/060275
Kind Code:
A1
Abstract:
Provided is an antireflection structure which has excellent antireflection performance and transparency and is reduced in the formation of wrinkles on the surface thereof. In order to solve the problem, the present invention is an antireflection structure 10 comprising at least an adhesive layer 20 and an antireflective film 30 formed on the adhesive layer 20 and having fine uneven structures respectively on both surfaces thereof, the antireflection structure 10 being characterized in that the storage modulus E' of the adhesive layer 20 is 25 MPa or more and each of the fine uneven structures respectively formed on the both surfaces of the antireflective film 30 has an unevenness period P that is equal to or shorter than the wavelength of visible ray.
Inventors:
SUGATA HIROSHI (JP)
TAZAWA HIROSHI (JP)
KAJIYA SHUNICHI (JP)
TAZAWA HIROSHI (JP)
KAJIYA SHUNICHI (JP)
Application Number:
PCT/JP2020/035799
Publication Date:
April 01, 2021
Filing Date:
September 23, 2020
Export Citation:
Assignee:
DEXERIALS CORP (JP)
International Classes:
C09J4/02; C09J7/30; C09J163/00; C09J201/00; G02B1/118; G02B7/02
Domestic Patent References:
| WO2013187349A1 | 2013-12-19 |
Foreign References:
| JP2015022108A | 2015-02-02 | |||
| JP2019084753A | 2019-06-06 | |||
| JP2009229507A | 2009-10-08 |
Other References:
See also references of EP 4036182A4
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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