ANTIREFLECTIVE COATINGS FOR HIGH-RESOLUTION PHOTOLITHOGRAPHIC SYNTHESIS OF DNA ARRAY

Title:

ANTIREFLECTIVE COATINGS FOR HIGH-RESOLUTION PHOTOLITHOGRAPHIC SYNTHESIS OF DNA ARRAY

Document Type and Number:

WIPO Patent Application WO2004001506

Kind Code:

A3

Abstract:

The present inventions provides an array of polymers and method of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coating on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.

Inventors:

TRULSON MARK (US)
MCGALL GLENN H (US)
SYWE BEI-SHEN (US)
KAJISA LISA T (US)
TRUONG DANA (US)

Application Number:

PCT/US2003/019586

Publication Date:

May 21, 2004

Filing Date:

June 20, 2003

Export Citation:

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Assignee:

AFFYMETRIX INC (US)
TRULSON MARK (US)
MCGALL GLENN H (US)
SYWE BEI-SHEN (US)
KAJISA LISA T (US)
TRUONG DANA (US)

International Classes:

B01J19/00; G01N33/53; C12M1/00; C12N15/09; C12Q1/68; G01N37/00; G03F7/09; C40B40/06; (IPC1-7): G12Q1/68

Foreign References:

US5576220A	1996-11-19
US6235471B1	2001-05-22
US6057424A	2000-05-02

Other References: