Title:
ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST
Document Type and Number:
WIPO Patent Application WO2000029906
Kind Code:
A3
Abstract:
The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.
Inventors:
PADMANABAN MUNIRATHNA
DAMMEL RALPH R
FICNER STANLEY A
OBERLANDER JOSEPH E
SAGAN JOHN P
DAMMEL RALPH R
FICNER STANLEY A
OBERLANDER JOSEPH E
SAGAN JOHN P
Application Number:
PCT/EP1999/008571
Publication Date:
October 05, 2000
Filing Date:
November 09, 1999
Export Citation:
Assignee:
CLARIANT INT LTD (CH)
International Classes:
G03F7/11; G03F7/09; H01L21/027; (IPC1-7): G03F7/09; G03F7/038
Domestic Patent References:
WO1998014832A1 | 1998-04-09 | |||
WO1998021038A1 | 1998-05-22 | |||
WO1998049602A1 | 1998-11-05 |
Other References:
DATABASE WPI Section Ch Week 198647, Derwent World Patents Index; Class A14, AN 1986-308958, XP002141156
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