Title:
ANTISTATIC COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2006/098214
Kind Code:
A1
Abstract:
Disclosed is an antistatic composition characterized by containing a polymer (A) containing a monomer unit represented by the general formula (1) below and a low molecular weight anionic compound (B). (1) (In the formula, R1 represents a hydrocarbon group containing a benzene ring; A's may be the same as or different from each other and respectively represent a methyl group or an ethyl group; m and n representing the average polymerization degree of oxyalkylene group are respectively a number of not less than 1; and p is a number of not less than 2.)
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Inventors:
ABE TETSUJI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
Application Number:
PCT/JP2006/304593
Publication Date:
September 21, 2006
Filing Date:
March 09, 2006
Export Citation:
Assignee:
ADEKA CORP (JP)
ABE TETSUJI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
ABE TETSUJI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
International Classes:
C08L61/14; C08K5/00; C08L69/00; C08L101/00; C09K3/16
Foreign References:
JP2002348564A | 2002-12-04 | |||
JP2002060734A | 2002-02-26 | |||
JPH11244609A | 1999-09-14 | |||
JP2004305882A | 2004-11-04 | |||
JPS63101444A | 1988-05-06 | |||
JPS62273252A | 1987-11-27 | |||
JP2000034330A | 2000-02-02 | |||
JP2002060734A | 2002-02-26 | |||
JP2002348564A | 2002-12-04 | |||
JPH11244609A | 1999-09-14 | |||
JP2004305882A | 2004-11-04 |
Other References:
See also references of EP 1862506A4
Attorney, Agent or Firm:
Soga, Michiteru (8th Floor Kokusai Building, 1-1, Marunouchi 3-chom, Chiyoda-ku Tokyo, JP)
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