Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ANTISTATIC COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2006/098214
Kind Code:
A1
Abstract:
Disclosed is an antistatic composition characterized by containing a polymer (A) containing a monomer unit represented by the general formula (1) below and a low molecular weight anionic compound (B). (1) (In the formula, R1 represents a hydrocarbon group containing a benzene ring; A's may be the same as or different from each other and respectively represent a methyl group or an ethyl group; m and n representing the average polymerization degree of oxyalkylene group are respectively a number of not less than 1; and p is a number of not less than 2.)

Inventors:
ABE TETSUJI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
Application Number:
PCT/JP2006/304593
Publication Date:
September 21, 2006
Filing Date:
March 09, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ADEKA CORP (JP)
ABE TETSUJI (JP)
SHIRAI HIROAKI (JP)
TSUDA TAKAYUKI (JP)
International Classes:
C08L61/14; C08K5/00; C08L69/00; C08L101/00; C09K3/16
Foreign References:
JP2002348564A2002-12-04
JP2002060734A2002-02-26
JPH11244609A1999-09-14
JP2004305882A2004-11-04
JPS63101444A1988-05-06
JPS62273252A1987-11-27
JP2000034330A2000-02-02
JP2002060734A2002-02-26
JP2002348564A2002-12-04
JPH11244609A1999-09-14
JP2004305882A2004-11-04
Other References:
See also references of EP 1862506A4
Attorney, Agent or Firm:
Soga, Michiteru (8th Floor Kokusai Building, 1-1, Marunouchi 3-chom, Chiyoda-ku Tokyo, JP)
Download PDF: