ANTISTATIC RESIN COMPOSITION AND MOLDED ARTICLE

Title:

ANTISTATIC RESIN COMPOSITION AND MOLDED ARTICLE

Document Type and Number:

WIPO Patent Application WO/2007/119339

Kind Code:

A1

Abstract:

Disclosed is an antistatic resin composition which comprises 40 to 98 mass% of an olefin resin (A) and 2 to 60 mass% of a block copolymer (B) having an olefin polymer block and a hydrophilic polymer block, and which can be molded into an article having a surface resistance (measured under the conditions of 23˚C and 50% RH) of 1x1011 Ω/□ or lower and having the leaching amount of sodium and potassium ions (measured under conditions of 80˚C and extraction for 60 minutes) of 3 μg/cm2 or less. The composition may contain a predetermined amount of a block copolymer having an aromatic vinyl compound polymer block and a conjugated diene compound polymer block or a hydrogenation product of the block copolymer and a predetermined amount of a styrene resin. The component (B) may be a combination of a block copolymer as mentioned above which has higher sodium and potassium contents and a block copolymer as mentioned above which has lower sodium and potassium contents. If required, the composition may contain a lithium salt (E). The composition has excellent antistatic properties, chemical resistance, molded article appearance and thermal stability, and has a reduced leaching amount of ions.

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Inventors:

MAWATARI, Masaaki (2-15-5, Shintom, Chuo-ku Tokyo 41, 1040041, JP)
馬渡政明 (〒41 東京都中央区新富二丁目１５番５号テクノポリマー株式会社内 Tokyo, 1040041, JP)

Application Number:

JP2007/054895

Publication Date:

October 25, 2007

Filing Date:

March 13, 2007

Export Citation:

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Assignee:

Techno Polymer Co., Ltd. (2-15-5, Shintomi Chuo-k, Tokyo 41, 1040041, JP)
テクノポリマー株式会社 (〒41 東京都中央区新富二丁目１５番５号 Tokyo, 1040041, JP)
MAWATARI, Masaaki (2-15-5, Shintom, Chuo-ku Tokyo 41, 1040041, JP)

International Classes:

C08L23/00; C08K5/42

Attorney, Agent or Firm:

IDE, Masatake et al. (M. IDE & CO, 9F Gobancho Grand Bldg., 3-1,Gobancho, Chiyoda-ku Tokyo 76, 1020076, JP)

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