Title:
ANTISTATIC SILICONE RELEASE FILM
Document Type and Number:
WIPO Patent Application WO/2020/189882
Kind Code:
A1
Abstract:
The present invention provides an antistatic silicone release film which does not have a side effect caused by an electrostatic discharge when being peeled from an adhesive, as the film has an excellent antistatic function, and which has a stable release characteristic, as the film has excellent adhesion to a base material of a hardening layer, and the hardening layer has a high degree of crosslinking.
Inventors:
LEE JEONG HWAN (KR)
AHN BYUNG CHEOL (KR)
KIM KIL JOONG (KR)
AHN BYUNG CHEOL (KR)
KIM KIL JOONG (KR)
Application Number:
PCT/KR2019/018281
Publication Date:
September 24, 2020
Filing Date:
December 23, 2019
Export Citation:
Assignee:
TORAY ADVANCED MAT KOREA INC (KR)
International Classes:
C08J7/04; C08G77/08; C08G77/12; C08G77/14; C08G77/20; C08J5/18; C09D7/61; C09D7/63; C09D7/65; C09D183/04
Foreign References:
KR20170096881A | 2017-08-25 | |||
KR20180036505A | 2018-04-09 | |||
KR20070006271A | 2007-01-11 | |||
KR20120077793A | 2012-07-10 | |||
KR20120040998A | 2012-04-30 |
Attorney, Agent or Firm:
KIM, Byung Joo (KR)
Download PDF:
Previous Patent: BIDET MAIN BODY HAVING FLAT LOWER SURFACE
Next Patent: ELECTRONIC DEVICE INCLUDING ELECTROSTATIC INDUCTION STRUCTURE
Next Patent: ELECTRONIC DEVICE INCLUDING ELECTROSTATIC INDUCTION STRUCTURE