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Title:
APPARATUS FOR CATALYTIC CHEMICAL VAPOR DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2007/148457
Kind Code:
A1
Abstract:
[PROBLEMS] An apparatus for catalytic chemical vapor deposition (Cat-CVD apparatus) in which a feed gas is decomposed by contact with a heated catalyst structure and a decomposition species generated by the decomposition or a species newly generated from the decomposition species is transported to a substrate to deposit a thin film on the substrate. That part of the catalyst structure which has a lower temperature than the other parts is inhibited from suffering a catalyst structure surface alteration attributable to the low temperature, such as silicidation. [MEANS FOR SOLVING PROBLEMS] In the Cat-CVD apparatus, only that part of the catalyst structure which has a lower temperature than the other parts has, disposed in at least the surface of the catalyst structure, a compound or mixture preventing that low-temperature part from undergoing an alteration which is different from that occurring in the other parts of the catalyst structure and is caused by the temperature decrease in that low-temperature part.

Inventors:
MATSUMURA, Hideki (1 Asahidai 1-chom, Nomi-shi Ishikawa 92, 9231292, JP)
松村英樹 (〒92 石川県能美市旭台一丁目1番地 北陸先端科学技術大学院大学内 Ishikawa, 9231292, JP)
OHDAIRA, Keisuke (1 Asahidai 1-chom, Nomi-shi Ishikawa 92, 9231292, JP)
Application Number:
JP2007/055838
Publication Date:
December 27, 2007
Filing Date:
March 22, 2007
Export Citation:
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Assignee:
Japan Advanced Institute of Science and Technology (1 Asahidai 1-chome, Nomi-shi Ishikawa, 92, 9231292, JP)
国立大学法人北陸先端科学技術大学院大学 (〒92 石川県能美市旭台一丁目1番地 Ishikawa, 9231292, JP)
MATSUMURA, Hideki (1 Asahidai 1-chom, Nomi-shi Ishikawa 92, 9231292, JP)
松村英樹 (〒92 石川県能美市旭台一丁目1番地 北陸先端科学技術大学院大学内 Ishikawa, 9231292, JP)
International Classes:
C23C16/44; B01J23/30; B01J33/00; C23C16/44; B01J23/16; B01J33/00
Attorney, Agent or Firm:
SUZUKI, Shoji et al. (Ohtakamico-Shinjuku Bldg, 9th Fl. 10-3, Shinjuku 1-chom, Shinjuku-ku Tokyo 22, 1600022, JP)
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