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Patent Searching and Data


Title:
APPARATUS FOR DEPOSITING ATOMIC LAYER AND METHOD FOR DEPOSITING ATOMIC LAYER USING SAME
Document Type and Number:
WIPO Patent Application WO/2020/036261
Kind Code:
A1
Abstract:
The present invention relates to an apparatus for depositing an atomic layer and a method for depositing an atomic layer using same. The apparatus for depositing an atomic layer, according to the present invention, is an apparatus for depositing an atomic layer for forming an atomic layer on a substrate, and comprises: a substrate transfer unit for seating a substrate thereon and transferring the substrate in a first direction and in a second direction different from the first direction; a gas supply unit, disposed above the substrate transferred by the substrate transfer unit, including a source gas supply module for supplying a source gas, a reactant gas supply module for supplying a reactant gas, and a purge gas supply module disposed between the source gas supply module and the reactant gas supply module; and a gas supply pipe unit including a source gas supply pipe for connecting the source gas supply module and a source gas supply source, and a reactant gas supply pipe connecting the reactant gas supply module and a reactant gas supply source, wherein at least one of the source gas supply module and the reactant gas supply module may change a gas supply direction with respect to the substrate according to a substrate transfer direction of the substrate transfer unit.

Inventors:
CHOI HAG YOUNG (KR)
CHOI YEONG TAE (KR)
KIM DONG WON (KR)
KIM SANG HUN (KR)
KIM KEUN SIK (KR)
Application Number:
PCT/KR2018/014690
Publication Date:
February 20, 2020
Filing Date:
November 27, 2018
Export Citation:
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Assignee:
NEXUSBE CO LTD (KR)
International Classes:
C23C16/455; C23C16/44; C23C16/54
Foreign References:
KR20160142059A2016-12-12
KR20140007623A2014-01-20
KR20150078306A2015-07-08
KR20130133489A2013-12-09
KR20130142869A2013-12-30
Attorney, Agent or Firm:
SUAN INTELLECTUAL PROPERTY (KR)
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