Title:
APPARATUS FOR DRYING SUBSTRATE AND METHOD FOR DRYING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2011/077937
Kind Code:
A1
Abstract:
Disclosed are: an apparatus for drying a substrate, which is capable of effectively preventing liquid droplets from remaining on the substrate and is capable of suppressing generation of water marks in comparison to Marangoni drying; and a method for drying a substrate.
Specifically disclosed is an apparatus for drying a substrate that has been cleaned with a diamagnetic liquid, which is provided with a magnet (4) for moving the liquid adhering to the substrate by means of magnetic force and a magnet conveying means (5) for moving the magnet (4) along the substrate toward the edge of the substrate. When a substrate that has been cleaned with a diamagnetic liquid is dried, the magnet (4) for moving the liquid adhering to the substrate by means of magnetic force is brought close to the substrate, and then the magnet (4) is moved along the substrate toward the edge of the substrate.
Inventors:
TAMURA, Akitake (650 Mitsuzawa Hosaka-cho, Nirasaki Cit, Yamanashi 92, 〒4070192, JP)
Application Number:
JP2010/071855
Publication Date:
June 30, 2011
Filing Date:
December 07, 2010
Export Citation:
Assignee:
TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku Tokyo, 25, 〒1076325, JP)
東京エレクトロン株式会社 (〒25 東京都港区赤坂五丁目３番１号 Tokyo, 〒1076325, JP)
東京エレクトロン株式会社 (〒25 東京都港区赤坂五丁目３番１号 Tokyo, 〒1076325, JP)
International Classes:
H01L21/304; F26B5/00
Attorney, Agent or Firm:
KOHNO, Takao (KOHNO PATENT OFFICE, 4-3 Tsuriganecho 2-chome, Chuo-ku, Osaka-sh, Osaka 35, 〒5400035, JP)
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