APPARATUS FOR ELIMINATING STATIC ELECTRICITY ON SEMICONDUCTOR SUBSTRATE AND LIQUID CRYSTAL SUBSTRATE SURFACES IN SEMICONDUCTOR AND LIQUID CRYSTAL MANUFACTURING PROCESSES

WIPO Patent Application WO/2007/046151

A1

An apparatus is provided for eliminating static electricity on semiconductor substrate and liquid crystal substrate surfaces in semiconductor and liquid crystal manufacturing processes. In the apparatus, a cylindrical filter is not exposed to a soft X-ray and the soft X-ray does not leak to the external of a guide container. A clean air generating part (1) provided with the cylindrical filter (5), a soft X-ray irradiating part (2) and an ionized clean air blowing part (3) are arranged in series in an air blowing direction in the guide container (4). The clean air generating part (1) is prevented from being exposed to the soft X-ray (19) by a shielding member (23). The clean air blowing part (3) has a structure for blowing out only ionized clean air (35) in a longitudinal direction at a uniform air volume to prevent the soft X-ray from leaking to the external of the guide container (4) of the soft X-ray (19).

KISAKIBARU TOSHIROU (JP)
OKADA MAKOTO (JP)
HONDA YASUSHI (JP)
IIDA NAOJI (JP)

PCT/JP2005/019401

April 26, 2007

October 21, 2005

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KONDOH IND LTD (JP)
CAMBRIDGE FILTER JAPAN LTD (JP)
KISAKIBARU TOSHIROU (JP)
OKADA MAKOTO (JP)
HONDA YASUSHI (JP)
IIDA NAOJI (JP)

H05F3/06

JP2005019044A

2005-01-20

YAMASAKI, Yukuzo et al. (Sogo Nagatacho Bldg. 8F 11-2,, 8, Nagatacho 1-chome,, Chiyoda-k, Tokyo14, JP)

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