Title:
APPARATUS FOR FORMING LAYER
Document Type and Number:
WIPO Patent Application WO/2011/019215
Kind Code:
A3
Abstract:
The present invention relates to an apparatus for forming a layer comprising: a load lock chamber into which a substrate is loaded; a transfer chamber in which a transfer robot transferring the substrate from the load lock chamber is installed; a reaction chamber which receives the substrate from the transfer robot and grows one or more epitaxial layer on the substrate; a process separation reaction chamber which receives the substrate including the grown epitaxial layer from the transfer robot of the transfer chamber and forms at least one epitaxial layer on the grown epitaxial layer; and a gas distributor which supplies a process gas to the reaction chamber and the process separation reaction chamber. The present invention obtains high efficiency and increases productivity by separating the epitaxial process for manufacturing a light emitting device.
Inventors:
KIM NAM JIN (KR)
Application Number:
PCT/KR2010/005289
Publication Date:
April 21, 2011
Filing Date:
August 12, 2010
Export Citation:
Assignee:
KIM NAM JIN (KR)
International Classes:
C23C16/44; C23C16/54; H01L21/205
Foreign References:
| KR20090035578A | 2009-04-09 | |||
| KR20080112512A | 2008-12-26 | |||
| KR20080100057A | 2008-11-14 | |||
| KR20090001353A | 2009-01-08 |
Attorney, Agent or Firm:
YANG, Moon Ock (2F.Samheung Yeoksam Bldg. 735-10,Yeoksam-dong, Gangnam-gu, Seoul 135-080, KR)
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