Title:
APPARATUS FOR INSPECTING SILICON WAFER DEFECT AND METHOD FOR INSPECTING SILICON WAFER DEFECT
Document Type and Number:
WIPO Patent Application WO/2009/157105
Kind Code:
A1
Abstract:
An apparatus for inspecting defects of a silicon wafer is provided with an infrared light illuminating apparatus for illuminating the silicon wafer by adjusting a light quantity corresponding to a specific resistivity of the silicon wafer, and an imaging section, which is composed of a line sensor array having sensitivity to infrared light and images the silicon wafer.
Inventors:
NAKAMURA, Manabu (5-12 Itachibori 2-chome, Nishi-ku, Osaka-sh, Osaka 12, 55000, JP)
Application Number:
JP2008/072725
Publication Date:
December 30, 2009
Filing Date:
December 09, 2008
Export Citation:
Assignee:
NIPPON ELECTRO-SENSORY DEVICES CORPORATION (5-12, Itachibori 2-chome Nishi-ku, Osaka-sh, Osaka 12, 55000, JP)
日本エレクトロセンサリデバイス株式会社 (〒12 大阪府大阪市西区立売堀２丁目５番１２号 Osaka, 55000, JP)
日本エレクトロセンサリデバイス株式会社 (〒12 大阪府大阪市西区立売堀２丁目５番１２号 Osaka, 55000, JP)
International Classes:
H01L21/66; G01N21/956
Attorney, Agent or Firm:
GOTO, Masaki (Shoyu-Kaikan, 3-1 Kasumigaseki 3-chome,Chiyoda-k, Tokyo 13, 10000, JP)
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