Title:
APPARATUS FOR MANUFACTURING ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/232698
Kind Code:
A1
Abstract:
An apparatus for manufacturing an array substrate and a method for manufacturing an array substrate. A photoresist coating device (20) and a polysilicon conversion device (10) are arranged to abut against each other, and the distance between a photoresist output port (21) of the photoresist coating device (20) and an emission port (11) of the polysilicon conversion device is smaller than the length of a substrate (30) in the moving direction of the substrate (30), so that the substrate (30) passes through both the polysilicon conversion device (10) and the photoresist coating device (20), and a polysilicon material layer (32) and a photoresist material layer (34) are formed simultaneously, thereby shortening the production cycle of the substrate and reducing product costs.
Inventors:
XU SHUNLONG (CN)
Application Number:
PCT/CN2017/089584
Publication Date:
December 27, 2018
Filing Date:
June 22, 2017
Export Citation:
Assignee:
SHENZHEN ROYOLE TECHNOLOGIES CO LTD (CN)
International Classes:
H01L21/336; H01L21/02; H01L29/786
Foreign References:
| CN103681244A | 2014-03-26 | |||
| CN103390592A | 2013-11-13 | |||
| US6884672B1 | 2005-04-26 | |||
| CN103839826A | 2014-06-04 |
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
Download PDF: