Title:
APPARATUS FOR MANUFACTURING CARBON FILM BY PLASMA CVD, METHOD FOR MANUFACTURING THE SAME, AND CARBON FILM
Document Type and Number:
WIPO Patent Application WO/2006/073017
Kind Code:
A1
Abstract:
[Problems] To provide a method for forming a carbon film homogeneously at a low cost and in a low power consumption. [Means for Solving the Problems] This carbon film forming method comprises the step of arranging a cylindrical member having an opening at its portion, in a vacuum chamber, the step of arranging a substrate in the cylindrical member, the step of introducing a carbon film forming gas into the vacuum chamber, and the step of applying a plasma generating voltage to the cylindrical member, to generate a plasma in the cylindrical member thereby to form the carbon film on the surface of the substrate by that plasma.
Inventors:
HABA MASANORI
Application Number:
PCT/JP2005/018894
Publication Date:
July 13, 2006
Filing Date:
October 13, 2005
Export Citation:
Assignee:
DIALIGHT JAPAN CO LTD (JP)
HABA MASANORI
HABA MASANORI
International Classes:
C01B31/02; C23C16/26; H01J63/06
Domestic Patent References:
| WO2000040509A1 | 2000-07-13 |
Foreign References:
| JPH0978242A | 1997-03-25 | |||
| JPH0769790A | 1995-03-14 | |||
| JPH09204832A | 1997-08-05 | |||
| JP2004303521A | 2004-10-28 | |||
| JP2002518280A | 2002-06-25 | |||
| JP2002293521A | 2002-10-09 | |||
| JP2004060130A | 2004-02-26 |
Other References:
JIANG N ET AL: "Carbon nanowalls for field-emissions and light-source applications.", PROC INT DISP WORKSHOPS., vol. 11, 2004, pages 1253 - 1254, XP002994948
Attorney, Agent or Firm:
Okada, Kazuhide (13-38 Naniwa-cho, Kita-k, Osaka-shi Osaka, JP)
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