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Title:
APPARATUS AND METHOD FOR CHARGED PARTICLE FILTERING AND APPARATUS AND METHOD FOR ION IMPLANTATION
Document Type and Number:
WIPO Patent Application WO2002033764
Kind Code:
A3
Abstract:
A charged particle filter provides a curved through path and has both magnetic poles for applying a magnetic field normal to the plane of curvature of the path and electrodes for applying a radial electric field. The filter is used as an energy filter downstream of an acelerator in an ion implanter. The filter can be set toprovide a range of energy dispersions, to operate as an achromatic bend, or to reject lower charge state ions.

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JP5149203A method of confining the magnetic fields of electromagnets, ion implantation systems, filtering systems for ion implantation systems, electromagnets used for mass spectrometry, and open frame electromagnets.
JPS63172956ARITHMETIC METHOD FOR MASS VALUE
Inventors:
GLAVISH HILTON F
JEN CAUSON KO-CHUAN
Application Number:
PCT/IB2001/002612
Publication Date:
December 24, 2003
Filing Date:
October 16, 2001
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
International Classes:
H01J37/05; H01J37/317; H01J49/28; H01M; (IPC1-7): H01J37/05; H01J49/28; H01J37/317
Domestic Patent References:
WO2001029876A22001-04-26
WO2000036630A12000-06-22
Foreign References:
US4054796A1977-10-18
US4945236A1990-07-31
US3984682A1976-10-05
US4645928A1987-02-24
US4924090A1990-05-08
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