received by the International Bureau on 10 March 2017 (10.03.2017)

1. (Currently Amended) A system for detecting trace metals in a fluid; a detector configured to receive a fluid sample in at least one input and at least one passageway extending therefrom:

a boron doped diamond electrode;

a reference electrode; and

a counter electrode.

2. (Currently Amended) The system of Claim [[2]] 1 wherein said detector

passageway extending-therefrom,-and -wherein said boron doped diamond electrode is located within said a passageway, of said at least one passageways;

3. (Currently Amended) The system of Claim 2 wherein said chip includes a plurality of boron doped diamond electrodes in said passageway([;]].

4. (Original) The system of Claim 1 wherein said detector is a chip having a substrate, a gasket and a top layer, which cooperate to form passageways and chambers.

5. (Currently Amendeci) The system of Claim 1 wherein said detector is a chip having:

wherein said boron doped diamond electrode is located proximate to said analysis chamber and a pH meter located in at least one of said analysis chamber and at least One of said at least one passageway.

6. (Original) The system of Claim 5 further comprising;

a second passageway extending between said input chamber and said analysis chamber;

a pH electrode configured to modify the pH of the fluid passing through the second passageway.

7. (Currently Amended) The system of Claim 6 further including:

a pH meter in said analysis chamber, and wherein the pH electrode is only located in said second passageway.

8. (Currently Amended) The system of Claim S further including:

a second input chamber;

a second passageway extending from said second input chamber to one of said first passageway or said first analysis chamber; and

a pH electrode configured to modify the pH of the fluid passing through the second passageway: and into either of said first passaqewav or said first analysis chamber.

9. (Original) he system of Claim 8 wherein Said analysis chamber includes a pH meter.

10. (Original) The system of Claim 5 further including a pH modifying chamber configured to Supply a fluid having a different pH than the sample to the analysis chamber and wherein the analysis chamber includes a pH meter.

11. (Original) The system of Claim 5 further including a pretreatment area having a pretreatment electrode located between said input chamber and said analysis chamber.

12. (Original) The system of Claim 5 further including a plurality of passageways and analysis chambers, each in parallel with the first passageway and first analysis chamber and wherein each analysis chamber includes at least one working electrode.

13. (Original) The system of Claim 5 further including at least one additional passageway and at least one additional analysis chamber arranged in series with said first passageway and analysis chamber.

14. (Original) The system of Claim 13 further including a volume adjustment chamber in fluid communication with at least one analysis chamber.

15. (Original) The system of Claim 5 further including at least one additional passageway and one additional analysis chamber arranged in parallel with said first passageway and said first analysis chamber and at least one more additional passageway and at least one more additional analysis chamber arranged in series.

16. (Original) The system of Claim 5 further including at least one additional passageway and one analysis chamber and wherein the fluid is cycled repeatedly in a cyclic fashion through the analysis chambers. ;

17. (Currently Amended) A method of forming a boron doped diamond electrode comprising the steps of:

depositing a boron doped diamond material on a substrate;

adding an insulative material over the boron doped diamond material;

growing additional boron doped diamond material on the exposed portions of the boron doped diamond material[[;]].

18. (Original) The method of Claim 17 further including the step of eroding away the insulative material before said step of growing.

19. (Original) The method of Claim 17 further including the step of treating the insulative material to prevent growth of diamond material before said step growing.

20. (Original) The method of Claim 20 wherein said step of treating includes at least one treatment selected from the group of: treating the insulative material with a hydrogen plasma, acid washing the insulative material, or ensuring a scratch free insulative surface.

21 . (Original) The method of Claim 17 wherein said step of growing occurs without any additional step of eroding the insulative material.

22. (Original) The method of Claim 17 further including the step of eroding away the insulative material after said step of growing.

23. (Original) A method of detecting trace metals in a fluid sample comprising the steps of:

applying a first predetermined electroplating potential to electroplate a first metal of interest to a working electrode:

running a reverse scan to release the metal from the working electrode to quantifythe amount of the first metal.

24. (Currently Amended) The method of Claim 23 further including thesteps of:

applying a second predetermined electroplating potential, which is more negative than the first electroplating potential, to electroplate the first and second metal together on the working electrode [[40]]; and

running a reverse scan on the Working electrode [[40]] to a positive potential to quantify the first and second metal together.

25. (Currently Amended) The method of Claim 24 further including the steps of: applying a third predetermined electroplating potential, which is more negative than the first and second electroplating potentials, to electroplate the first, second and third metal together on the working electrode;

running a reverse scan on the working electrode [[40]] to a positive potential to quantify the first, second and third metal together.

26. (Original) The method of Claim 25 further including repeating the steps of applyi ng a potential and running a reverse scan for each additional desired metal to be quantified.

27. (Original) The method of Claim 23 further including a step of holding a positive potential to condition/clean the working electrode surface before said step of applying.

28. (Original) The method of Claim 23 wherein said reverse scan is one of LV, SWV, or DPV. 29. (Original) The method of Claim 26 using a chip with a plurality of analysis chambers and wherein further including the step of pumping the fluid sample to a new chamber induding a working electrode, before each step of applying.

30. (Currently Amended) The method of Claim 26 using a chip having a plurality of analysis chambers and wherein each of the applying [[a]] and running steps are done in parallel in different analysis chambers.

31. (Original) A method of detecting trace metals in a fluid sample using a chip with a plurality of analysis chambers each having a working electrode, said method comprising the steps of:

applying a predetermined electroplating potential to each working electrode either simultaneously, in series with overlap, or in series spaced apart to electroplate the metal of interest to each respective working electrode;

running a reverse scan on each working electrode [[40]] to quantify the metals on each electrode [[40J], again simultaneously, in series with overlap/ or in seriesspaced apart; and ;

analyzing the scan of each electrode to determine the amount of metal on each electrode.

32. (Original) The method of Claim 31 wherein said step of analyzing includes the step of subtracting the amount of metals form the adjacent electrode by applied potential to determine the amount of metal without metals attracted by the adjacent electrode in potential applied

33. (Original) The method of Claim 32 further including the step of holding a positive potential to condition/clean all working electrode surfaces for the next measurement.

34. (Original) The method of Claim 33 wherein said step of cleaning is applied to all electrode simultaneously.