Title:
APPARATUS AND METHOD FOR HORIZONTAL PLATING
Document Type and Number:
WIPO Patent Application WO/2019/190115
Kind Code:
A1
Abstract:
The present invention relates to an apparatus and a method for plating and, more specifically, to: an apparatus for performing uniform pattern plating on a substrate placed in a horizontal direction and a method therefor, and presents a plating apparatus, which can be variously applied to, for example, a plating process for manufacturing a mask for light exposure for a photolithography process, etc.; and a method therefor.
Inventors:
HUH WOOK HWAN (KR)
KIM NAM JIN (KR)
SIM YOUNG SUB (KR)
KIM NAM JIN (KR)
SIM YOUNG SUB (KR)
Application Number:
PCT/KR2019/003208
Publication Date:
October 03, 2019
Filing Date:
March 20, 2019
Export Citation:
Assignee:
EXTOL CO LTD (KR)
International Classes:
C25D5/02; C25D1/00; C25D1/10; C25D7/06; C25D17/00; C25D17/06; C25D17/12
Foreign References:
| KR20180000133A | 2018-01-02 | |||
| KR20080014519A | 2008-02-14 | |||
| KR20140060423A | 2014-05-20 | |||
| KR19990045932A | 1999-06-25 | |||
| KR101788678B1 | 2017-10-20 |
Attorney, Agent or Firm:
KIM, Aera (KR)
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