Title:
APPARATUS AND METHOD FOR OPTICALLY DETECTING DEFECTS IN VOLTAGE CONTRAST TEST STRUCTURES
Document Type and Number:
WIPO Patent Application WO2003100473
Kind Code:
A3
Abstract:
Disclosed are apparatus and methods (Figs. 1-3B) for optically inspecting a voltage contrast type test structure (100), or the like. An optical image of a voltage contrast type test structure (100, 200, 300) is generated. When the optical image has a first type of intensity pattern (202 and 204), it is determined that there is a defect (212) within the test structure (200). When the optical image has a second type of intensity pattern (102 and 104), it is determined that there is no defect. The intensity patterns correspond to different voltage potential patterns that are expected to be generated if the test structure were subject to a voltage contrast inspection. That is, the first intensity pattern (202 and 204) corresponds to a first voltage potential pattern that would be generated during a voltage contrast inspection when there is a defect (212) present, and the second intensity pattern(102 and 104), corresponds to a second voltage potential pattern that would be generated during a voltage contrast inspection when there is not defect present.
Inventors:
LIN JASON C H
OESTREICH STEVEN G
OESTREICH STEVEN G
Application Number:
PCT/US2003/016462
Publication Date:
February 19, 2004
Filing Date:
May 23, 2003
Export Citation:
Assignee:
KLA TENCOR TECH CORP (US)
International Classes:
G01R31/311; (IPC1-7): G01R31/305; G01R31/02; G01R31/302; G01R31/308
Foreign References:
| US5412330A | 1995-05-02 | |||
| US6052355A | 2000-04-18 | |||
| US6232787B1 | 2001-05-15 | |||
| US6252412B1 | 2001-06-26 | |||
| US6504393B1 | 2003-01-07 | |||
| US6509750B1 | 2003-01-21 |
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