Title:
APPARATUS AND METHOD FOR TREATMENT OF METAL SURFACES BY INORGANIC ELECTROPHORETIC PASSIVATION
Document Type and Number:
WIPO Patent Application WO2005033371
Kind Code:
A3
Abstract:
The present invention relates to an apparatus (100) and a process for electrolytically treating a metal surface. The apparatus includes an electrochemical cell (110) which includes an anodic chamber (112), a cathodic chamber (114), and a divider (116) separating the anodic chamber from the cathodic chamber. The anodic chamber has an anode and contains a conductive anodic medium (120). The cathodic chamber has, as a cathode (122), the metal surface to be treated, and contains a conductive cathodic medium (124) including a silica compound. In one embodiment, during operation of the apparatus, the anode remains substantially free of accumulation of foreign materials. In another embodiment, during operation of the apparatus, organic or inorganic compounds in the conductive cathodic medium remain substantially free of oxidation by the anode. In one embodiment, the treating comprises deposition of a silicon-containing mineral on the metal surface.
Inventors:
KOCHILLA JOHN R (US)
BISHOP CRAIG V (US)
STAPLES WILLIAM B (US)
OPASKAR VINCENT C (US)
BISHOP CRAIG V (US)
STAPLES WILLIAM B (US)
OPASKAR VINCENT C (US)
Application Number:
PCT/US2004/029599
Publication Date:
April 06, 2006
Filing Date:
September 13, 2004
Export Citation:
Assignee:
ATOTECH DEUTSCHLAND GMBH (DE)
KOCHILLA JOHN R (US)
BISHOP CRAIG V (US)
STAPLES WILLIAM B (US)
OPASKAR VINCENT C (US)
KOCHILLA JOHN R (US)
BISHOP CRAIG V (US)
STAPLES WILLIAM B (US)
OPASKAR VINCENT C (US)
International Classes:
C25C7/00; C25D9/08; C25D13/02; C25D13/22; C25D17/00; (IPC1-7): C25D17/00; C25D13/02
Domestic Patent References:
| WO2003039609A1 | 2003-05-15 |
Foreign References:
| US20030178317A1 | 2003-09-25 | |||
| EP0022113A1 | 1981-01-07 | |||
| US4595473A | 1986-06-17 |
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