Title:
APPARATUS FOR PREVENTING RESIDUAL OZONE DISCHARGE AND TREATING TOXIC MATERIALS
Document Type and Number:
WIPO Patent Application WO/2010/126337
Kind Code:
A2
Abstract:
The present invention relates to an apparatus for treating hazardous substances in contaminated water which is also capable of preventing emission of residual ozone remaining in the treated water. The main elements of the present invention comprise: an ejector including a constricting pipe having an upper circumference that gradually constricts, an expanding pipe having a lower circumference that gradually expands, and an inlet pipe between the constricting pipe and the expanding pipe into which ozone discharged from a vacuum pipe flows, such that the ejector is supplied with contaminated water and ozone from the constricting pipe and the inlet pipe, respectively, and the raw water and ozone mix together; and an aeration tank into which the mixture of ozone and water are injection sprayed and separated into treated water and residual ozone, then discharging said residual ozone through an ozone treatment pipe at an upper portion and discharging treated water through a discharge pipe, wherein an inlet of the discharge pipe is disposed at a central upper portion of the aeration tank, and an atmospheric pressure control unit communicating with the outside atmosphere is formed on a side surface of the discharge pipe.
Inventors:
SONG JAE-YUN (KR)
Application Number:
PCT/KR2010/002767
Publication Date:
November 04, 2010
Filing Date:
April 30, 2010
Export Citation:
Assignee:
OXENTECH CO LTD (KR)
RA YOUNG HYUN (KR)
SONG JAE-YUN (KR)
RA YOUNG HYUN (KR)
SONG JAE-YUN (KR)
International Classes:
C02F1/78; B01D19/00; C01B13/10
Foreign References:
| KR100578524B1 | 2006-05-03 | |||
| KR20000073107A | 2000-12-05 | |||
| KR100788849B1 | 2007-12-27 |
Attorney, Agent or Firm:
JEON, Jong-Il (KR)
전종일 (KR)
전종일 (KR)
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