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Title:
APPARATUS FOR PRODUCING SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND COMPUTER STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/102866
Kind Code:
A1
Abstract:
An apparatus for producing a semiconductor device, which comprises: a substrate holding unit which holds a substrate; an electrolytic treatment unit which performs an electrolytic treatment on the substrate that is held by the substrate holding unit; and a terminal for applying a voltage to the substrate that is held by the substrate holding unit. The electrolytic treatment unit comprises: a base material which is arranged so as to face the substrate holding unit; a treatment liquid supply unit which is provided on the base material and supplies a treatment liquid to the substrate from the surface of the base material; a direct electrode which is provided on the surface of the base material so as to be in contact with the treatment liquid that is supplied to the substrate, and between which and the substrate a voltage is applied; and an indirect electrode which is provided inside the base material so as to generate an electric field in the treatment liquid that is supplied to the substrate.

Inventors:
HOSHINO, Tomohisa (272-4 Takaono, Ozu-machi, Kikuchi-gu, Kumamoto 32, 〒8691232, JP)
HAMADA, Masato (272-4 Takaono, Ozu-machi, Kikuchi-gu, Kumamoto 32, 〒8691232, JP)
YAMAGUCHI, Kiyomitsu (1-1 Fukuhara, Koshi Cit, Kumamoto 16, 〒8611116, JP)
Application Number:
JP2018/041621
Publication Date:
May 31, 2019
Filing Date:
November 09, 2018
Export Citation:
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Assignee:
TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku Tokyo, 25, 〒1076325, JP)
International Classes:
C25D17/10; C25D17/06; C25D21/04; C25D21/12; H01L21/288
Domestic Patent References:
WO2017094568A12017-06-08
Foreign References:
JP2014227556A2014-12-08
JP2000073197A2000-03-07
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (Akebono International, Kakubari Building 1-20, Sumiyoshi-cho, Shinjuku-k, Tokyo 65, 〒1620065, JP)
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