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Title:
APPARATUS FOR PRODUCING SEMICONDUCTOR NANOPARTICLES AND METHOD FOR PRODUCING SEMICONDUCTOR NANOPARTICLES
Document Type and Number:
WIPO Patent Application WO/2018/139446
Kind Code:
A1
Abstract:
An apparatus for producing semiconductor nanoparticles, which is provided with: a spray part which sprays at least one of a liquid (1) that contains at least one of a group 12 element and a group 13 element and a liquid (2) that contains at least one of a group 15 element and a group 16 element; and a reactor to which the other one of the liquid (1) and the liquid (2), which has not been sprayed, is supplied so that droplets of the liquid sprayed by the spray part come into contact with the droplets of the other liquid, thereby mixing the liquid (1) and the liquid (2) with each other so that at least one of the group 12 element and the group 13 element contained in the liquid (1) and at least one of the group 15 element and the group 16 element contained in the liquid (2) are reacted with each other.

Inventors:
SANO TAIZO (JP)
WAKISAKA AKIHIRO (JP)
KOSUDA SHORI (JP)
HIRATANI MASAHIKO (JP)
MABUCHI YUSUKE (JP)
Application Number:
PCT/JP2018/001977
Publication Date:
August 02, 2018
Filing Date:
January 23, 2018
Export Citation:
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Assignee:
AIST (JP)
HITACHI CHEMICAL CO LTD (JP)
International Classes:
C09K11/08; B01J19/00; B82Y30/00; B82Y40/00; C01B19/04; C01B25/08; C09K11/54; C09K11/56; C09K11/70; H01L21/208
Domestic Patent References:
WO2016031695A12016-03-03
WO2012173262A12012-12-20
WO2007086279A12007-08-02
Foreign References:
JP2014224337A2014-12-04
JP2014508086A2014-04-03
US20100028249A12010-02-04
JPS59154456A1984-09-03
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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