APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE AND METHODS THEREFOR

Title:

APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE AND METHODS THEREFOR

Document Type and Number:

WIPO Patent Application WO2007038030

Kind Code:

B1

Abstract:

An apparatus generating a plasma for removing fluorinated polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the fluorinated polymer.

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Inventors:

YOON HYUNGSUK ALEXANDER (US)
BOYD JOHN (US)
KUTHI ANDRAS (US)
BAILEY III ANDREW D (US)

Application Number:

PCT/US2006/036139

Publication Date:

January 24, 2008

Filing Date:

September 15, 2006

Export Citation:

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Assignee:

LAM RES CORP (US)
YOON HYUNGSUK ALEXANDER (US)
BOYD JOHN (US)
KUTHI ANDRAS (US)
BAILEY III ANDREW D (US)

International Classes:

H01J7/24; H01L21/302

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