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Title:
APPARATUSES FOR DETECTING RADIATION AND THEIR METHODS OF MAKING
Document Type and Number:
WIPO Patent Application WO/2020/198929
Kind Code:
A1
Abstract:
An apparatus for detecting radiation and a method of making it. The method may comprise forming a recess (104) into a semiconductor substrate (102), wherein a portion (107) of the semiconductor substrate (102) extends into the recess (104) and is surrounded by the recess (104); forming a semiconductor single crystal (106) in the recess (104), the semiconductor single crystal (106) having a different composition from the semiconductor substrate (102); forming a first doped semiconductor region (108) in the semiconductor substrate (102); forming a second doped semiconductor region (109) in the semiconductor substrate (102); wherein the first doped semiconductor region (108) and the second doped semiconductor region (109) form a p-n junction that separates the portion (107) from the rest of the semiconductor substrate (102).

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Inventors:
LIU YURUN (CN)
CAO PEIYAN (CN)
Application Number:
PCT/CN2019/080402
Publication Date:
October 08, 2020
Filing Date:
March 29, 2019
Export Citation:
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Assignee:
SHENZHEN XPECTVISION TECH CO LTD (CN)
International Classes:
G01T3/08
Domestic Patent References:
WO2018201308A12018-11-08
WO2010037830A12010-04-08
WO2019019040A12019-01-31
Foreign References:
CN101432893A2009-05-13
CN101401208A2009-04-01
CN107710021A2018-02-16
US20060138477A12006-06-29
KR20140083747A2014-07-04
JP2011257255A2011-12-22
Other References:
See also references of EP 3948359A4
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