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Title:
APPLICATION DEVICE, DRYING DEVICE, LIGHT IRRADIATION DEVICE, AND APPLICATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/075620
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an application device of which an extending portion can be easily replaced and cleaned, for example, and that has excellent maintainability and improved stability of an extending operation by the extending portion. An application device 10 applies a film-forming liquid onto a peripheral portion of a substrate while the substrate and an application unit 20 are moved relative to each other. The application unit 20 includes an application mechanism 21 and an extension mechanism 30. The application mechanism 21 comprises an applying portion 22 that applies the film-forming liquid onto at least a peripheral-portion end surface of the substrate. The extension mechanism 30 comprises: an extending portion 31 that extends the film-forming liquid applied by the applying portion 22 into a thin film on the peripheral-portion end surface of the substrate and the upper and lower surfaces of the peripheral portion; and a biasing mechanism 34 that biases the extending portion 31 toward the peripheral-portion end surface of the substrate and the upper and lower surfaces of the peripheral portion. The application device 10 is configured such that the extending portion 31 can be removed without removing the biasing mechanism 34 from the extension mechanism 30.

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Inventors:
YOSHIZUKA HIDETO (JP)
YAMAMOTO AKIHITO (JP)
WATANABE SHO (JP)
Application Number:
PCT/JP2023/035357
Publication Date:
April 11, 2024
Filing Date:
September 28, 2023
Export Citation:
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Assignee:
ENATECH CORP (JP)
International Classes:
H05K3/28; B05C1/02; B05C9/12; B05C9/14; B05C11/00; B05C11/02; B05C11/10; B05C13/02; F26B15/12
Attorney, Agent or Firm:
IUCHI Ryuji et al. (JP)
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