Title:
APPLICATION DEVICE, APPLICATION METHOD, AND BAND-LIKE APPLICATION OBJECT
Document Type and Number:
WIPO Patent Application WO/2006/117999
Kind Code:
A1
Abstract:
Provided are a flow rate restriction-type application device where, even if application liquid has a variation in temperature, temperature retaining water blocks the transmission of heat to prevent deformation of the device, an applied film formed has less variation, and capable of producing a highly uniform application object; a application method using the application device; and a band-like application object obtained. The application device feeds application liquid to an application liquid discharge section through a slit after spreading the liquid in a width direction by a chamber, and applies the liquid, while forming a bead, to the surface of a band-like body that moves continuously. The application device has temperature retaining water paths around the chamber and around the slit.
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Inventors:
SHIMIZU NAOKI (JP)
MIYAGAWA ICHIRO (JP)
MINAMINO DAIKI (JP)
MIYAGAWA ICHIRO (JP)
MINAMINO DAIKI (JP)
Application Number:
PCT/JP2006/307899
Publication Date:
November 09, 2006
Filing Date:
April 14, 2006
Export Citation:
Assignee:
KONICA MINOLTA HOLDINGS INC (JP)
SHIMIZU NAOKI (JP)
MIYAGAWA ICHIRO (JP)
MINAMINO DAIKI (JP)
SHIMIZU NAOKI (JP)
MIYAGAWA ICHIRO (JP)
MINAMINO DAIKI (JP)
International Classes:
B05C5/02; B05D1/26
Foreign References:
| JP2005270879A | 2005-10-06 | |||
| JP2000084457A | 2000-03-28 | |||
| JPH0615214A | 1994-01-25 | |||
| JPS53260A | 1978-01-05 |
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