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Title:
AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2019/208684
Kind Code:
A1
Abstract:
According to the present invention, an aqueous composition can be provided, the aqueous composition containing: (A) 0.0001-10 mass% of one or more compounds selected from among a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonic acid ester, a C4-13 alkylphosphonic acid, and salts thereof, ; and (B) 0.0001-50 mass% of an acid or a salt thereof with respect to the total amount of the composition, said acid being not the C4-13 alkylphosphonic acid, the C4-13 alkylphosphonic acid ester, and the C4-13 alkylphosphonic acid.

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Inventors:
OIE TOSHIYUKI (JP)
KIKUNAGA TAKAHIRO (JP)
HORITA AKINOBU (JP)
YAMADA KENJI (JP)
Application Number:
PCT/JP2019/017586
Publication Date:
October 31, 2019
Filing Date:
April 25, 2019
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
H01L21/304; C11D7/06; C11D7/08; C11D7/10; C11D7/26; C11D7/36; C23F1/16; C23G1/02; H01L21/308; H01L21/3205; H01L21/768
Domestic Patent References:
WO2018061670A12018-04-05
WO2017208749A12017-12-07
WO2018061365A12018-04-05
Foreign References:
JP2016527707A2016-09-08
JP2017519862A2017-07-20
JP2013533631A2013-08-22
JP2016171294A2016-09-23
JP2017025326A2017-02-02
Other References:
See also references of EP 3787009A4
Attorney, Agent or Firm:
KOBAYASHI Hiroshi et al. (JP)
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